Showing results 6 to 10 of 10
Fabrication of nano-gap electrode pairs using atomic-layer-deposited sacrificial layer and shadow deposition Park, CW; Lim, JW; Yu, HY; Pi, UH; Ryu, MK; Choi, Sung-Yool, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, v.45, pp.4293 - 4295, 2006-05 |
Properties of PVD Hafnium oxide films in metal-insulator-metal structure and the role of HfN barrier at dielectric/metal interface Cho, Byung Jin; Kim, SJ; Lim, HF; Hu, H; Yu, XF; Yu, HY; Li, MF, 2nd International Conference on Materials for Advanced Technologies, pp.513 - 513, 2003-12-11 |
Study of PVD HfO2 and HfOxNy as dielectrics for MIM capacitor application Cho, Byung Jin; Lim, HF; Kim, SJ; Hu, H; Yu, XF; Yu, HY; Li, MF, International Conference on Materials for Advanced Technologies, pp.532 - 532, 2003-12-11 |
The fabrication technique and electrical properties of a free-standing GaN nanowire Yu, HY; Kang, BH; Park, CW; Pi, UH; Lee, CJ; Choi, Sung-Yool, APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, v.81, no.2, pp.245 - 247, 2005-07 |
Thermal stability of (HfO2)(x)(Al2O3)(1-x) on Si Yu, HY; Wu, N; Li, MF; Zhu, CX; Cho, Byung Jin; Kwong, DL; Tung, CH; et al, APPLIED PHYSICS LETTERS, v.81, no.19, pp.3618 - 3620, 2002-11 |
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