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College of Engineering(공과대학)School of Electrical Engineering(전기및전자공학부)EE-Conference Papers(학술회의논문)

Properties of PVD Hafnium oxide films in metal-insulator-metal structure and the role of HfN barrier at dielectric/metal interfaceProperties of PVD Hafnium oxide films in metal-insulator-metal structure and the role of HfN barrier at dielectric/metal interface

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Cho, Byung Jinresearcher / Kim, SJ / Lim, HF / Hu, H / Yu, XF / Yu, HY / Li, MF
Issue Date
2003-12-11
Language
ENG
Citation

2nd International Conference on Materials for Advanced Technologies, pp.513 - 513

URI
http://hdl.handle.net/10203/145112
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EE-Conference Papers(학술회의논문)
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