Browse "Dept. of Materials Science and Engineering(신소재공학과)" by Subject GRAPHOEPITAXY
Showing results 1 to 36 of 36
| A Path to Ultranarrow Patterns Using Self-Assembled Lithography Jung, Yeon Sik; Chang, Jae-Byum; Verploegen, Eric; Berggren, Karl K.; Ross, C. A., NANO LETTERS, v.10, no.3, pp.1000 - 1005, 2010-03 |
| A plasmonic biosensor array by block copolymer lithography Shin, Dong-Ok; Jeong, Jong-Ryul; Han, Tae-Hee; Koo, Chong-Min; Park, Hye-Jeong; Lim, Yong-Taik; Kim, Sang-Ouk, JOURNAL OF MATERIALS CHEMISTRY, v.20, no.34, pp.7241 - 7247, 2010-09 |
| Anomalous Rapid Defect Annihilation in Self-Assembled Nanopatterns by Defect Melting Kim, Bong Hoon; Park, So Jung; Jin, Hyeong Min; Kim, Ju Young; Son, Seung-Woo; Kim, Myung-Hyun; Koo, Chong Min; et al, NANO LETTERS, v.15, no.2, pp.1190 - 1196, 2015-02 |
| Assembly of Sub-10-nm Block Copolymer Patterns with Mixed Morphology and Period Using Electron Irradiation and Solvent Annealing Son, Jeong Gon; Chang, Jae-Byum; Berggren, Karl K.; Ross, Caroline A., NANO LETTERS, v.11, no.11, pp.5079 - 5084, 2011-11 |
| Atomic Layer Deposition Assisted Pattern Multiplication of Block Copolymer Lithography for 5 nm Scale Nanopatterning Moon, Hyoung Seok; Kim, Juyoung; Jin, Hyeong Min; Lee, Woo Jae; Choi, Hyeon Jin; Mun, Jeong Ho; Choi, Young Joo; et al, ADVANCED FUNCTIONAL MATERIALS, v.24, no.27, pp.4343 - 4348, 2014-07 |
| Block copolymer multiple patterning integrated with conventional ArF lithography Park, Seung-Hak; Shin, Dong-Ok; Kim, Bong-Hoon; Yoon, Dong-Ki; Kim, Kyoung-Seon; Lee, Si-Yong; Oh, Seok-Hwan; et al, SOFT MATTER, v.6, no.1, pp.120 - 125, 2010 |
| Block Copolymer with an Extremely High Block-to-Block Interaction for a Significant Reduction of Line-Edge Fluctuations in Self Assembled Patterns Kim, Jong Min; Hur, Yoon Hyung; Jeong, Jae Won; Nam, Tae Won; Lee, Jung Hye; Jeon, Kiung; Kim, YongJoo; et al, CHEMISTRY OF MATERIALS, v.28, no.16, pp.5680 - 5688, 2016-08 |
| Complex self-assembled patterns using sparse commensurate templates with locally varying motifs Yang, Joel K. W.; Jung, Yeon Sik; Chang, Jae-Byum; Mickiewicz, R. A.; Alexander-Katz, A.; Ross, C. A.; Berggren, Karl K., NATURE NANOTECHNOLOGY, v.5, no.4, pp.256 - 260, 2010-04 |
| Controlled Segmentation of Metal Nanowire Array by Block Copolymer Lithography and Reversible Ion Loading Mun, Jeong Ho; Cha, Seung Keun; Kim, Ye Chan; Yun, Taeyeong; Choi, Young Joo; Jin, Hyeong Min; Lee, Jae Eun; et al, SMALL, v.13, no.17, 2017-05 |
| Deep-Nanoscale Pattern Engineering by Immersion-Induced Self-Assembly Park, Woon Ik; Kim, Jong Min; Jeong, Jae Won; Jung, Yeon Sik, ACS NANO, v.8, no.10, pp.10009 - 10018, 2014-10 |
| Directed self-assembly of a two-state block copolymer system Do, Hyung Wan; Choi, Hong Kyoon; Gadelrab, Karim R.; Chang, Jae-Byum; Alexander-Katz, Alfredo; Ross, Caroline A.; Berggren, Karl K., NANO CONVERGENCE, v.5, 2018-09 |
| Directed self-assembly of cylinder-forming diblock copolymers on sparse chemical patterns Yang, Yong-Biao; Choi, Young Joo; Kim, Sang-Ouk; Kim, Jaeup U., SOFT MATTER, v.11, no.22, pp.4496 - 4506, 2015-06 |
| Eliminating the Trade-Off between the Throughput and Pattern Quality of Sub-15 nm Directed Self-Assembly via Warm Solvent Annealing Kim, Jong Min; Kim, YongJoo; Park, Woon Ik; Hur, Yoon Hyung; Jeong, Jae Won; Sim, Dong Min; Baek, Kwang Min; et al, ADVANCED FUNCTIONAL MATERIALS, v.25, no.2, pp.306 - 315, 2015-01 |
| Enhanced self-assembly of block copolymers by surface modification of a guiding template Park, Woon Ik; Choi, Young Joong; Yuk, Jong Min; Seo, Hyeon Kook; Kim, Kwang Ho, POLYMER JOURNAL, v.50, no.2, pp.221 - 229, 2018-02 |
| Enhancing the Directed Self-assembly Kinetics of Block Copolymers Using Binary Solvent Mixtures Park, Woon Ik; Choi, Young Joong; Yun, Je Moon; Hong, Suck Won; Jung, Yeon Sik; Kim, Kwang Ho, ACS APPLIED MATERIALS INTERFACES, v.7, no.46, pp.25843 - 25850, 2015-11 |
| Enhancing the Potential of Block Copolymer Lithography with Polymer Self-Consistent Field Theory Simulations Mickiewicz, Rafal A.; Yang, Joel K. W.; Hannon, Adam F.; Jung, Yeon Sik; Alexander-Katz, Alfredo; Berggren, Karl K.; Ross, Caroline A., MACROMOLECULES, v.43, no.19, pp.8290 - 8295, 2010-10 |
| Flexible and Transferrable Self-Assembled Nanopatterning on Chemically Modified Graphene Kim, Ju-Young; Kim, Bong-Hoon; Hwang, Jin-Ok; Jeong, Seong-Jun; Shin, Dong-Ok; Mun, Jeong-Ho; Choi, Young-Joo; et al, ADVANCED MATERIALS, v.25, no.9, pp.1331 - 1335, 2013-03 |
| Hierarchical Directed Self-Assembly of Diblock Copolymers for Modifi ed Pattern Symmetry Choi, Young Joo; Kim, Ju Young; Kim, Ji Eun; Mun, Jeong-Ho; Cha, Seung Keun; Kim, Sang Ouk, ADVANCED FUNCTIONAL MATERIALS, v.26, no.35, pp.6462 - 6470, 2016-09 |
| Hierarchically Self-Assembled Block Copolymer Blends for Templating Hollow Phase-Change Nanostructures with an Extremely Low Switching Current Park, Woon Ik; Kim, Jong Min; Jeong, Jae Won; Hur, Yoon Hyoung; Choi, Young Joong; Kwon, Se-Hun; Hong, Daniel Seungbum; et al, CHEMISTRY OF MATERIALS, v.27, no.7, pp.2673 - 2677, 2015-04 |
| Highly Ordered Square Arrays from a Templated ABC Triblock Terpolymer Son, Jeong Gon; Gwyther, Jessica; Chang, Jae-Byum; Berggren, Karl K.; Manners, Ian; Ross, Caroline A., NANO LETTERS, v.11, no.7, pp.2849 - 2855, 2011-07 |
Highly tunable refractive index visible-light metasurface from block copolymer self-assembly Kim, Ju Young; Kim, Hyowook; Kim, Bong Hoon; Chang, Taeyong; Lim, Joonwon; Jin, Hyeong Min; Mun, Jeong Ho; et al, NATURE COMMUNICATIONS, v.7, 2016-09 |
| Host-Guest Self-assembly in Block Copolymer Blends Park, Woon Ik; Kim, YongJoo; Jeong, Jae Won; Kim, Kyungho; Yoo, Jung-Keun; Hur, Yoon Hyung; Kim, Jong Min; et al, SCIENTIFIC REPORTS, v.3, 2013-11 |
| In Situ Nanolithography with Sub-10 nm Resolution Realized by Thermally Assisted Spin-Casting of a Self-Assembling Polymer Lee, Jung Hye; Kim, YongJoo; Cho, Joong-Yeon; Yang, Se Ryeun; Kim, Jong Min; Yim, Soonmin; Lee, Heon; et al, ADVANCED MATERIALS, v.27, no.33, pp.4814 - 4822, 2015-09 |
| Laser-Directed Self-Assembly of Highly Aligned Lamellar and Cylindrical Block Copolymer Nanostructures: Experiment and Simulation Yong, Daeseong; Jin, Hyeong Min; Kim, Sang Ouk; Kim, Jaeup U., MACROMOLECULES, v.51, no.4, pp.1418 - 1426, 2018-02 |
| Long-Range Ordered Self-Assembly of Novel Acrylamide-Based Diblock Copolymers for Nanolithography and Metallic Nanostructure Fabrication Lee, Je Gwon; Jung, Yeon Sik; Han, Sung-Hwan; Kim, Kwan-Mook; Han, Yang-Kyoo, ADVANCED MATERIALS, v.26, no.18, pp.2894 - 2900, 2014-05 |
| Nanodomain Swelling Block Copolymer Lithography for Morphology Tunable Metal Nanopatterning Mun, Jeong Ho; Cha, Seung Keun; Kim, Hyowook; Moon, Hyoung-Seok; Kim, Ju Young; Jin, Hyeong Min; Choi, Young Joo; et al, SMALL, v.10, no.18, pp.3742 - 3749, 2014-09 |
| Nanopatterns with a Square Symmetry from an Orthogonal Lamellar Assembly of Block Copolymers Cha, Seung Keun; Yong, Daeseong; Yang, Geon Gug; Jin, Hyeong Min; Kim, Jang Hwan; Han, Kyuhyo; Kim, Jaeup U.; et al, ACS APPLIED MATERIALS & INTERFACES, v.11, no.22, pp.20265 - 20271, 2019-06 |
| Nanotransfer Printing with sub-10 nm Resolution Realized using Directed Self-Assembly Jeong, Jae-Won; Park, Woon-Ik; Do, Lee-Mi; Park, Jong-Hyun; Kim, Tae-Heon; Chae, Gee-Sung; Jung, Yeon-Sik, ADVANCED MATERIALS, v.24, no.26, pp.3526 - 3531, 2012-07 |
| Negative-Tone Block Copolymer Lithography by In Situ Surface Chemical Modification Kim, Bong-Hoon; Byeon, Kyeong-Jae; Kim, Juyoung; Kim, Jinseung; Jin, Hyeong Min; Cho, Joong-Yeon; Jeong, Seong-Jun; et al, SMALL, v.10, no.20, pp.4207 - 4212, 2014 |
| Proximity Injection of Plasticizing Molecules to Self-Assembling Polymers for Large-Area, Ultrafast Nanopatterning in the Sub-10-nm Regime Jeong, Jae-Won; Hur, Yoon-Hyung; Kim, Hyeong-Jun; Kim, Jong-Min; Park, Woon-Ik; Kim, Mi-Jeong; Kim, Bum-Joon; et al, ACS NANO, v.7, no.8, pp.6747 - 6757, 2013-08 |
| Self-Assembly-Induced Formation of High-Density Silicon Oxide Memristor Nanostructures on Graphene and Metal Electrodes Park, Woon-Ik; Yoon, Jong-Moon; Park, Moon-Kyu; Lee, Jin-Sup; Kim, Sung-Kyu; Jeong, Jae-Won; Kim, Kyung-Ho; et al, NANO LETTERS, v.12, no.3, pp.1235 - 1240, 2012-03 |
| Si-containing block copolymers for self-assembled nanolithography Ross, CA; Jung, Yeon Sik; Chuang, VP; Ilievski, F; Yang, JKW; Bita, I; Thomas, EL; et al, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.26, no.6, pp.2489 - 2494, 2008-11 |
| Solvent-Vapor-Induced Tunability of Self-Assembled Block Copolymer Patterns Jung, Yeon Sik; Ross, Caroline A., ADVANCED MATERIALS, v.21, no.24, pp.2540 - 2540, 2009-06 |
| Tunable and rapid self-assembly of block copolymers using mixed solvent vapors Park, Woon Ik; Tong, Sheng; Liu, Yuzi; Jung, Il Woong; Roelofs, Andreas; Hong, Seungbum, NANOSCALE, v.6, no.24, pp.15216 - 15221, 2014 |
| Ultralarge-Area Block Copolymer Lithography Enabled by Disposable Photoresist Prepatterning Jeong, Seong-Jun; Moon, Hyoung-Seok; Kim, Bong-Hoon; Kim, Ju-Young; Yu, Jae-Ho; Lee, Su-Mi; Lee, Moon-Gyu; et al, ACS NANO, v.4, no.9, pp.5181 - 5186, 2010-09 |
| Well-Ordered Thin-Film Nanopore Arrays Formed Using a Block-Copolymer Template Jung, Yeon Sik; Ross, Caroline A., SMALL, v.5, no.14, pp.1654 - 1659, 2009-07 |
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