Solvent-Vapor-Induced Tunability of Self-Assembled Block Copolymer Patterns
Self-assembly of a block copolymer into cylindrical and/or perforated lamellar arrays within substrate trenches can be extensively tuned during the solvent-annealing process. Following reactive-ion etching SEM images reveal that the, solvent mixing ratio and the vapor pressure determine the type of array obtained and influence the dimensions of the repeat unit.
- Publisher
- WILEY-V C H VERLAG GMBH
- Issue Date
- 2009-06
- Language
- English
- Article Type
- Article
- Keywords
ABC TRIBLOCK COPOLYMERS; THIN-FILMS; MORPHOLOGY; INTERFACE; ALIGNMENT; POLYMERS; GRAPHOEPITAXY; LITHOGRAPHY; CONFINEMENT; TEMPLATES
- Citation
ADVANCED MATERIALS, v.21, no.24, pp.2540 - 2540
- ISSN
- 0935-9648
- Appears in Collection
- MS-Journal Papers(저널논문)
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