| 1 | A study on the residual stress measurement methods on chemical vapor deposition diamond films Kim, JG; Yu, Jin, JOURNAL OF MATERIALS RESEARCH, v.13, no.11, pp.3027 - 3033, 1998-11 |
| 2 | An elastic/plastic analysis of the intrinsic stresses in chemical vapor deposited diamond films on silicon substrates Yu, Jin; Kim, JG; Chung, JO; Cho, DH, JOURNAL OF APPLIED PHYSICS, v.88, no.3, pp.1688 - 1694, 2000-08 |
| 3 | Calculation of intrinsic stress by creep deformation of an Si substrate on chemical vapor deposited diamond films Kim, JG; Yu, Jin; Cho, DH; Baik, YJ, DIAMOND AND RELATED MATERIALS, v.9, no.1, pp.61 - 66, 2000-01 |
| 4 | Characterization of mechanical properties of chemical vapor deposited SiC by instrumented indentation technique = 나노인덴테이션 기법을 활용한 화학기상 증착 탄화규소의 역학특성 분석 연구link Jong-Ho Kim; 김종호; et al, 한국과학기술원, 2008 |
| 5 | Charge-related deposition phenomena in silicon CVD = 실리콘 CVD에서 charge에 관련된 증착 현상link Cheong, Woo-Seock; 정우석; et al, 한국과학기술원, 1998 |
| 6 | Composition and electrical properties of metallic Ru thin films deposited using Ru(C6H6)(C6H8) precursor Choi, J; Choi, Y; Hong, J; Tian, H; Roh, JS; Kim, Y; Chung, TM; et al, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.41, pp.6852 - 6856, 2002-11 |
| 7 | Deposition of fluorinated amorphous carbon thin films as a low-dielectric-constant material Han, Sang Soo; Kim, Hun Rae; Bae, Byeong-Soo, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.146, no.9, pp.3383 - 3388, 1999-09 |
| 8 | Direct Observation of a Carbon Filament in Water-Resistant Organic Memory Lee, Byung-Hyun; Bae, Hagyoul; Seong, Hyejeong; Lee, Dong-Il; Park, Hongkeun; Choi, Young Joo; Im, Sung-Gap; et al, ACS NANO, v.9, no.7, pp.7306 - 7313, 2015-07 |
| 9 | Effect of interfacial carbide layer on the Raman spectra in chemical-vapor deposited diamond films Kim, JG; Yu, Jin; Lee, JC, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.38, no.2A, pp.777 - 780, 1999-02 |
| 10 | Effects of ball-milling on lithium insertion into multi-walled carbon nanotubes synthesized by thermal chemical vapour deposition Eom, J; Kim, D; Kwon, Hyuk-Sang, JOURNAL OF POWER SOURCES, v.157, pp.507 - 514, 2006-06 |
| 11 | EFFECTS OF DEPOSITION RATE ON THE ENCROACHMENT IN TUNGSTEN FILMS REDUCED BY H-2 PARK, YW; KIM, IL; Park, Chong-Ook; Chun , Soung Soon, JOURNAL OF MATERIALS SCIENCE, v.26, no.19, pp.5318 - 5322, 1991-10 |
| 12 | Effects of Deposition Temperature on the microstructure of MOCVD Y1Ba2Cu3O7-x Thin-Films Cho, CY; Hwang, D; No, Kwangsoo; Chun , Soung Soon; Kim, SH, JOURNAL OF MATERIALS SCIENCE, v.28, no.11, pp.2915 - 2922, 1993-06 |
| 13 | Effects of electrodes on the electric properties of Pb(Zr,Ti)O-3 films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition Chung, SO; Lee, HC; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.39, no.3A, pp.1203 - 1209, 2000-03 |
| 14 | Effects of the chemical etching of single-walled carbon nanotubes on their lithium storage properties Eom, Ji-Yong; Kwon, Hyuk-Sang, MATERIALS CHEMISTRY AND PHYSICS, v.126, no.1-2, pp.108 - 113, 2011-03 |
| 15 | Electrochemical insertion of lithium into multiwalled carbon nanotube/silicon composites produced by ballmilling Eom, JY; Park, JW; Kwon, Hyuk-Sang; Rajendran, S, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.153, no.9, pp.1678 - 1684, 2006 |
| 16 | Formation of TiO2 thin films using NH3 as catalyst by metalorganic chemical vapor deposition Jung, Sung-Hoon; Kang, Sang-Won, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1, v.40, no.5A, pp.3147 - 3152, 2001-05 |
| 17 | FRAM 소자 응용을 위한 ECR PECVD PZT 커패시터 특성에 미치는 전극의 영향 = Effect of electrodes on the characteristics of ECR PECVD PZT capacitors for the application to FRAM deviceslink 이희철; Lee, Hee-Chul; et al, 한국과학기술원, 2002 |
| 18 | Growth and characterization of zinc oxide nanostructures on (111) silicon substrates with aluminum compound layer Kang, Dong-Suk; Han, Seok Kyu; Yang, Sang Mo; Kim, Jae Goo; Hwang, Wook Jung; Hong, Soon-Ku; Lee, Jae Wook; et al, JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.53, pp.292 - 298, 2008-07 |
| 19 | $H_2/Ar/TiCl_4$ 및 $N_2/H_2/Ar/TiCl_4$ 유도결합 플라즈마 CVD 법에 의한 Ti 및 TiN 박막의 증착 특성 연구 = Investigation of the $H_2/Ar/TiCl_4$ and $N_2/H_2/Ar/TiCl_4$ inductively coupled plasma enhanced CVD system for the deposition of Ti and TiN filmslink 장성수; Jang, Seong-Soo; et al, 한국과학기술원, 2001 |
| 20 | Improved lithium insertion/extraction properties of single-walled carbon nanotubes by high-energy ball milling Eom, JiYong; Kwon, Hyuk-Sang, JOURNAL OF MATERIALS RESEARCH, v.23, pp.2458 - 2466, 2008-09 |
| 21 | Interfacial microstructure of diffusion-bonded SiC and Re with Ti interlayer Kim, Joo-Hyung; Kim, Dong-Seok; Lim, Seong Taek; Kim, Do Kyung, JOURNAL OF ALLOYS AND COMPOUNDS, v.701, pp.316 - 320, 2017-04 |
| 22 | Kinetic model for cavity filling in CECVD of copper = 촉매 처리에 의한 구리 CECVD의 cavity filling 현상에 관한 모델link Lee, Hyun-Bae; 이현배; et al, 한국과학기술원, 2005 |
| 23 | Measurement of residual stress in diamond films obtained using chemical vapor deposition Kim, JG; Yu, Jin, JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS EXPRESS LETTERS, v.37, no.7B, pp.890 - 893, 1998-07 |
| 24 | Preparation and characterization of Pb(Zr,Ti)O-3 films deposited on Pt/RuO2 hybrid electrode for ferroelectric random access memory devices Lee, HC; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.40, no.11, pp.6566 - 6573, 2001-11 |
| 25 | Preparation of Single-Walled Carbon Nanotube/Silicon Composites and Their Lithium Storage Properties Eom, Ji-Yong; Kwon, Hyuk-Sang, ACS APPLIED MATERIALS INTERFACES, v.3, no.4, pp.1015 - 1021, 2011-04 |
| 26 | Ru 전구체의 열분해 메카니즘과 Ru 박막의 화학기상 증착 = Thermal decomposition mechanism of Ru precursor and chemical vapor deposition of Ru filmslink 최종완; Choi, Jong-Wan; et al, 한국과학기술원, 2004 |
| 27 | Si 기판위에 Hot filmanent CVD법으로 제조된 다이아몬드 박막의 응력 해석 = Stress analysis in diamond thin films on Si wafer deposited by hot filament chemical vapor depositionlink 차승일; Cha, Seung-Il; et al, 한국과학기술원, 1998 |
| 28 | Surface structure and field emission property of carbon nanotubes grown by radio-frequency plasma-enhanced chemical vapor deposition Jung, Yeon Sik; Jeon, Duk Young, Applied Surface Science, Volume 193, Issues 1-4, 5 June 2002, Pages 129-137, 2002 |
| 29 | THE ADHESION OF LOW-PRESSURE CHEMICALLY VAPOR-DEPOSITED TUNGSTEN FILMS ON SILICON AND SIO2 FOR SIH4-H2-WF6 AND H2-WF6 PROCESSES PARK, YW; Park, Chong-Ook; Chun , Soung Soon, THIN SOLID FILMS, v.201, no.1, pp.167 - 175, 1991-06 |
| 30 | Transformer coupled plasma enhanced metal organic chemical vapor deposition of Ta(Si)N thin films and their Cu diffusion barrier properties Park, HL; Byun, KM; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.41, no.10, pp.6153 - 6164, 2002-10 |
| 31 | 국부적이며 연속적인 열처리를 이용한 방향성을 지닌 고품질 그래핀 제조 및 응용 = Synthesis of graphene with oriented domains using local and sequential heating CVDlink 오세란; Oh, Se-Ran; et al, 한국과학기술원, 2013 |
| 32 | 유기금속화학증착법으로 증착된 (Ba,Sr)$TiO_3$ 박막의 투과전자현미경연구 = A transmission electron microscopy study on (Ba,Sr)$TiO_3$ thin films deposited by metal-organic chemical vapor depositionlink 유동철; Yoo, Dong-Chul; et al, 한국과학기술원, 2000 |
| 33 | 입자형 핵연료에 응용되는 CVD 탄화규소 코팅 층의 특성 평가 = Characterization of CVD silicon carbide coating layer application for nuclear fuel particlelink 이현근; Lee, Hyeon-Keun; et al, 한국과학기술원, 2006 |
| 34 | 화학기상증착법으로 제조된 다결정 다이아몬드 박막의 전기적 특성 = Electrical properties of chemical vapor deposited polycrystalline diamond thin filmslink 이범주; Lee, Bum-Joo; et al, 한국과학기술원, 1999 |
| 35 | 화학증착법에 의해 제조된 나노 다층박막의 구조, 기계적 특성 및 절삭 성능에 미치는 영향 = Structural and mechanical properties of nano-multilayered CVD coatings and their influence on cutting performancelink 박근우; Park, Geun-Woo; et al, 한국과학기술원, 2007 |
| 36 | 화학증착법으로 제조한 다이아몬드막에서의 잔류응력에 관한 연구 = A study of residual stresses on CVD diamond filmslink 김정근; Kim, Jung-Geun; et al, 한국과학기술원, 1998 |
