Si 기판위에 Hot filmanent CVD법으로 제조된 다이아몬드 박막의 응력 해석Stress analysis in diamond thin films on Si wafer deposited by hot filament chemical vapor deposition
- Advisors
- 홍순형researcher; Hong, Soon-Hyungresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 1998
- Identifier
- 133561/325007 / 000963612
- Language
- kor
- Description
학위논문(석사) - 한국과학기술원 : 재료공학과, 1998.2, [ 85 p. ]
- Keywords
열처리; 잔류응력; 다이아몬드박막; 화학기상증착; Annealing; CVD; Stress; Diamond thin film
- Appears in Collection
- MS-Theses_Master(석사논문)
- Files in This Item
- There are no files associated with this item.
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