$H_2/Ar/TiCl_4$ 및 $N_2/H_2/Ar/TiCl_4$ 유도결합 플라즈마 CVD 법에 의한 Ti 및 TiN 박막의 증착 특성 연구 = Investigation of the $H_2/Ar/TiCl_4$ and $N_2/H_2/Ar/TiCl_4$ inductively coupled plasma enhanced CVD system for the deposition of Ti and TiN films

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Advisors
이원종researcherLee, Won-Jongresearcher
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
2001
Identifier
165737/325007 / 000955326
Language
kor
Description

학위논문(박사) - 한국과학기술원 : 재료공학과, 2001.2, [ ix, 127 p. ]

Keywords

기상화학증착; 타이타늄 나이트라이드; 타이타늄; 유도결합플라즈마; 플라즈마; plasma; CVD; TiN; Ti; inductively coupled plasma

URI
http://hdl.handle.net/10203/50410
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=165737&flag=dissertation
Appears in Collection
MS-Theses_Ph.D.(박사논문)
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