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Browse "Dept. of Materials Science and Engineering(신소재공학과)" by Subject inductively coupled plasma

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Showing results 1 to 6 of 6

1
CH_3OH 유도결합 플라즈마를 이용한 Magnetic Tunnel Junction 물질의 건식식각특성 연구 = Dry etching characteristics of magnetic tunnel junction materials in CH_3OH inductively coupled plasma systemlink

이민석; Lee, Min-Suk; et al, 한국과학기술원, 2012

2
Effects of post annealing and oxidation processes on the removal of damage generated during the shallow trench etch process

Lee, YJ; Hwang, SW; Oho, KH; Lee, JeongYong; Yeom, GY, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.37, no.12B, pp.6916 - 6921, 1998-12

3
$H_2/Ar/TiCl_4$ 및 $N_2/H_2/Ar/TiCl_4$ 유도결합 플라즈마 CVD 법에 의한 Ti 및 TiN 박막의 증착 특성 연구 = Investigation of the $H_2/Ar/TiCl_4$ and $N_2/H_2/Ar/TiCl_4$ inductively coupled plasma enhanced CVD system for the deposition of Ti and TiN filmslink

장성수; Jang, Seong-Soo; et al, 한국과학기술원, 2001

4
Reaction characteristics between Cu thin film and RF inductively coupled Cl-2 plasma without/with UV irradiation

Kwon, MS; Lee, JeongYong; Choi, KS; Han, CH, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.37, no.7, pp.4103 - 4108, 1998-07

5
Structure of SiO2 Films Grown at Low Temperature by Inductively Coupled Plasma Oxidation with Oxygen Gas

Choi, Yong Woo; Ahn, Jin Hyung; Ahn, Byung Tae, ELECTRONIC MATERIALS LETTERS, v.1, no.2, pp.97 - 102, 2005-12

6
유도결합 플라즈마를 이용한 PZT 박막의 건식에칭 특성에 관한 연구 = A study on the etching characteristics of PZT films using Inductively coupled Plasmalink

정진기; Jung, Jin-Ki; et al, 한국과학기술원, 2001

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