An ellipsometric data acquisition method is introduced to measure the optical properties of sample. It is based on a microellipsometer hardware layout integrated a high numerical aperture objective lens, which is aligned in the normal direction of sample surface. This technique enables to achieve ellipsometric data at multiple incident angle with a sub-mu m probe beam size, moreover real-time measurement is possible due to no moving parts. The experimental results of different SiO2 thin film are demonstrated, also calibration technique is described. (c) 2007 Optical Society of America.