MS-Journal Papers(저널논문)
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1
Advanced parametrization for the production of high-energy solid-state lithium pouch cells containing polymer electrolytes
Lee, Wonmi; Lee, Juho; Yu, Taegyun; Kim, Hyeong-Jong; Kim, Min Kyung; Jang, Sungbin; Kim, Juhee; Han, Yu-Jin; Choi, Sunghun; Choi, Sinho; Kim, Tae-Hee; Park, Sang-Hoon; Jin, Wooyoung; Song, Gyujin; Seo, Dong-Hwa; Jung, Sung-Kyun; Kim, Jinsoo, Nature Communications, v.15, no.1, 2024-12
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Polarity control of siloxane composite films for triboelectric nanogenerator based self-powered body temperature monitoring
Kang, Seung-Mo; Shin, Jung Ho; Kim, Jeong Hyeon; Kang, Hyun Seok; Jung, Chang Kyu; Lee, Han Eol; Bae, Byeong-Soo, Nano Energy, v.127, 2024-08
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Artificial synaptic devices based on biomimetic electrochemistry: A review
Baek, Ji Hyun; Im, In Hyuk; Hur, Eun-Mi; Park, Jungwon; Lim, Jongwoo; Kim, Sangbum; Kang, Kibum; Kim, SY; Song, JY; Jang, Ho Won, MATERIALS RESEARCH BULLETIN, v.176, 2024-08
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Advancing Charge Density in Temperature‐Dependent Amphiphile Metal–Organic Polyhedra‐Based Triboelectric Nanogenerators
Ippili, Swathi; Kumar, Gobbilla Sai; Sharma, Arti; Ko, Yoonah; Hong, Seungbum; Goddati, Mahendra; Saini, Haneesh; Lee, Jaebeom; Yang, Tae‐Youl; Siddhanta, Soumik; Jella, Venkatraju; Yoon, Soon‐Gil; Jayaramulu, Kolleboyina, Advanced Energy Materials, 2024-08
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Lateral Piezoelectricity of Alzheimer's Aβ Aggregates
Jang, Jinhyeong; Joo, Soyun; Yeom, Jiwon; Jo, Yonghan; Zhang, Jingshu; Hong, Seungbum; Park, Chan Beum, ADVANCED SCIENCE, 2024-08
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Zn anode with hydrophobic and ferroelectric P(VDF-TrFE) layers for dendrite-free aqueous Zn-ion batteries
Park, Hyeonghun; Seol, Woojun; Park, Geumyong; Anoop, Gopinathan; Kim, Juhun; Tamulevicius, Tomas; Tamulevicius, Sigitas; Joo, Soyun; HONG, DANIEL SEUNGBUM; Jo, Ji Young; Kim, Hyeong-Jin, APPLIED SURFACE SCIENCE, v.660, 2024-07
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Self-Healing Materials for 3D Printing
Andreu, Alberto; Lee, Haeseung; Kang, Jiheong; Yoon, Yong Jin, ADVANCED FUNCTIONAL MATERIALS, v.34, no.30, 2024-07
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Wafer-Scale Synthesis of Highly Oriented 2D Topological Semimetal PtTe2 via Tellurization
Choi, Minhyuk; Oh, Saeyoung; Hahn, Sungsoo; Ji, Yubin; Jo, Min-kyung; Kim, Jeongtae; Ju, Tae-Seong; Kim, Gyeongbo; Gyeon, MinSeung; Lee, Yuhwa; Do, Jeonghyeon; Choi, Seungwook; Kim, Ansoon; Yang, Seungmo; Hwang, Chanyong; Kim, Kab-Jin; Cho, Doohee; Kim, Changyoung; Kang, Kibum; Jeong, Hu Young; Song, Seungwoo, ACS Nano, v.18, no.23, pp.15154 - 15166, 2024-06
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Diffusion Control on the Van der Waals Surface of Monolayers for Uniform Bi-Layer MoS2 Growth
Kim, TaeSoo; Noh, Gichang; Kwon, Seongdae; Kim, Ji Yoon; Dhakal, Krishna P.; Oh, Saeyoung; Chai, Hyun-Jun; Park, Eunpyo; Kim, In Soo; Lee, Eunji; Kim, Youngbum; Lee, Jaehyun; Jo, Min-kyung; Kang, MinSoo; Park, Cheolmin; Kim, Jeongho; Park, Jeongwon; Kim, Suhyun; Kim, Mingyu; Kim, Yuseok; Choi, Sung-Yool; Song, Seungwoo; Jeong, Hu-Young; Kim, Jeongyong; Kwak, Joon Young; Kang, Kibum, ADVANCED FUNCTIONAL MATERIALS, v.34, no.23, 2024-06
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Structural alignment of ZnO columns across multiple monolayer MoS2 layers as compliant substrates
Wang, Xuejing; Kim, Kyungtae; Derby, Benjamin K.; McGuckin, Terrence; Calderon, Gabriel A.; Pettes, Michael T.; Hwang, Jinwoo; Kim, Yeonhoo; Park, Jeongwon; Chen, Aiping; Kang, Kibum; Yoo, Jinkyoung, NANOSCALE, v.16, no.23, pp.11156 - 11162, 2024-06
Collection's Items (Sorted by Submit Date in Descending order): 7181 to 7200 of 7251
| Analysis of a transient region during the initial stage of atomic layer deposition Lim, Jung-Wook; Park, Hyung-Sang; Kang, Sang-Won, JOURNAL OF APPLIED PHYSICS, v.88, no.11, pp.6327 - 6331, 2000-09 |
| A Study of Cu Metal Deposition on Amorphous Si Film from Cu solution for Low-Temperature Crystallization of Amorphous Si Films Sohn, Dong-Hyun; Lee, Jeong No; Kang, Sang-Won; Ahn, Byung Tae, Journal of The Electrochemical Society, vol.144, no.10, pp.3592-3596, 1997-07-01 |
| Kinetic Modeling of Film Growth Rate in Atomic Layer Deposition Lim, J.; Park, H.; Sang-Won Kang, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.148, no.6, pp.C403 - C408, 2001-06 |
| Plasma-enhanced atomic layer deposition of Ta-N thin films Park, JS; Park, HS; Kang, Sang-Won, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.149, no.1, pp.28 - 32, 2002-01 |
| Atomic layer deposition of Al2O3 thin films using trimethylaluminum and isopropyl alcohol Jeon, WS; Yang, S; Lee, CS; Kang, Sang-Won, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.149, no.6, pp.306 - 310, 2002-06 |
| Bottom-up filling of submicrometer features in catalyst-enhanced chemical vapor deposition of copper Shim, KC; Lee, HB; Kwon, OK; Park, HS; Koh, W; Kang, Sang-Won, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.149, no.2, pp.109 - 113, 2002-02 |
| Atomic layer deposition of nickel by the reduction of preformed nickel oxide Chae, Junghun; Park, Hyuong-Sang; Kang, Sang-Won, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.5, no.6, pp.C64 - C66, 2002-06 |
| Plasma-enhanced atomic layer deposition of TaN thin films using tantalum-pentafluoride and N-2/H-2/Ar plasma Chung, Hoi-Sung; Kwon, Jung-Dae; Kang, Sang-Won, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.153, no.11, pp.C751 - C754, 2006 |
| PEALD of a ruthenium adhesion layer for copper interconnects Kwon, OK; Kwon, SH; Park, HS; Kang, SW, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.151, no.12, pp.C753 - C756, 2004 |
| Plasma-enhanced atomic layer deposition of Ru-TiN thin films for copper diffusion barrier metals Kwon, SH; Kwon, OK; Min, JS; Kang, SW, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.153, no.6, pp.G578 - G581, 2006 |
| Enhancement of dielectric constant in HfO2 thin films by the addition of Al2O3 Park, Pan Kwi; Kang, Sang-Won, APPLIED PHYSICS LETTERS, v.89, no.19, 2006-11 |
| Interface effect on dielectric constant of HfO2/Al 2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition Park, Pan Kwi; Cha, Eun-Soo; Kang, Sang-Won, APPLIED PHYSICS LETTERS, v.90, no.23, pp.232906, 2007-06 |
| Atomic layer deposition of ruthenium thin films for copper glue layer Kwon, OK; Kim, JH; Park, HS; Kang, SW, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.151, no.2, pp.G109 - G112, 2004-01 |
| Film growth model of atomic layer deposition for multicomponent thin films Kim, JH; Kim, JY; Kang, SW, JOURNAL OF APPLIED PHYSICS, v.97, no.9, 2005-05 |
| Step coverage modeling of thin films in atomic layer deposition Kim, Ja-Yong; Ahn, Ji-Hoon; Kang, Sang-Won; Kim, Jin-Hyock, JOURNAL OF APPLIED PHYSICS, v.101, no.7, 2007-04 |
| Improvement of the morphological stability by stacking RuO2 on ru thin films with atomic layer deposition Kwon, Se-Hun; Kwon, Oh-Kyum; Kim, Jae-Hoon; Jeong, Seong-Jun; Kim, Sung-Wook; Kang, Sang-Won, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.154, no.9, pp.H773 - H777, 2007 |
| The Mechanism of Si Incorporation and the Digital Control of Si Content during the Metallorganic Atomic Layer Deposition of Ti-Si-N Thin Films Min, Jae-Sik; Park, Jin-Seong; Park, Hyung-Sang; Kang, Sang-Won, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.147, no.10, pp.3868 - 3872, 2000-06 |
| Effect of crystallinity and nonstoichiometric region on dielectric properties of SrTiO3 films formed on Ru Kim, Ja-Yong; Ahn, Ji-Hoon; Kang, Sang-Won; Kim, Jin-Hyock; Roh, Jae-Sung, APPLIED PHYSICS LETTERS, v.91, no.9, 2007-08 |
| Measurement of thermal expansion coefficient of poly-Si using microgauge sensors Chae, Jung-Hun; Lee, Jae-Youl; Kang, Sang-Won, SPIE Vol. 3242, pp.202-211, 1997 |
| A.C. Complex Impedance Investigation of RuO2-Glass Composites Koo, Bon Keup; No, Kwangsoo; Kim, Ho Gi, IEEE TRANSACTIONS ON COMPONENTS, HYBRIDS AND MANUFACTURING TECHNOLOGY, v.14, no.3, pp.580 - 584, 1991-09 |
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