Showing results 1 to 8 of 8
Application of Chemical technology to dry etching process Woo, Seong-Ihl; Nam, CW; Kim, JH, 한국화학공학회 학술발표회, pp.14 - 1, 한국화학공학회, 1989 |
Characterization of spin-on-glass films for planarization process Nam, CW; Woo, Seong-Ihl, 한국화학공학회 추계학술발표회, 한국화학공학회, 1992-10 |
Charaterization of SOG film containing methyl and phenyl group during heat treatment Nam, CW; Woo, Seong-Ihl, First Semiconductor Symposium of Korea., pp.101 -, 1994 |
Effect of CO and CO2 addition in CF4/O2 gas system on tungsten etching Kwon, SK; Nam, CW; Woo, Seong-Ihl, 한국화학공학회 추계학술발표회, 한국화학공학회, 1990-10 |
Effect of CO ans CO2 addition to CF4/O2 gas system on the etch rate and selectivity of W Kwon, SK; Nam, CW; Chung, IJ; Woo, Seong-Ihl, Conference on Semiconductors Materials, Component & CAD, pp.161 -, 1991 |
Effect of Diluent Gas and Rapid Thermal Annealin gon the Properties of Plasma Deposited Silicon Nitride Films Nam, CW; Woo, Seong-Ihl; Kim, YT; Min, SK, International Conference on VLSI and CAD, pp.356 - 359, 1991 |
Preparation and Characterization of SOG thin film for interdielectric layer and planarization Nam, CW; Woo, Seong-Ihl, 3rd Industry/Academy Cooperation Research Seminar, Electronic Ceramics Research Center, pp.119 - 225, 1993 |
Preparation and Electric Properties of Spin-on Glass Films for the Planarization Process in Multilevel Interconnection Nam, CW; Woo, Seong-Ihl, 한국화학공학회 추계학술발표회, 한국화학공학회, 1993-10 |
Discover