Showing results 1 to 27 of 27
193-nm photoresists based on norbornene copolymers with derivatives of bile acid Kim, Jin-Baek; Lee, BW; Yun, HJ; Kwon, YG, CHEMISTRY LETTERS, v.149, pp.414 - 415, 2000-04 |
A hydrogel pen for electrochemical reaction and its applications for 3D printing Kang, Hosuk; Hwang, Seongpil; Kwak, Ju-Hyoun, NANOSCALE, v.7, no.3, pp.994 - 1001, 2015-01 |
A New Type of Eco-Friendly Resist Based on Nonchemically Amplified System Park, Ji Young; Yun, Je Moon; Kim, Jin-Baek, JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, v.46, no.22, pp.7534 - 7542, 2008-11 |
Acid diffusion control in chemically amplified resists Kim, Jin-Baek; Choi, JH; Kwon, YG; Jung, MH; Chang, KH, POLYMER, v.40, no.4, pp.1087 - 1089, 1999-02 |
Control of Nanogap Separation by Surface-Catalyzed Chemical Deposition Park, HJ; Lee, CY; Chung, YH; Chi, YS; Choi, Insung; Yun, WS, JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.11, no.7, pp.6400 - 6403, 2011-07 |
Control of photogenerated acid diffusion and evaporation by copolymerization with a basic monomer Kim, Jin-Baek; Kwon, YG; Choi, JH; Jung, MH, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.17, no.5, pp.2097 - 2102, 1999 |
Direct visualization of hyaluronic acid polymer chain by self-assembled one-dimensional array of gold nanoparticles Lee, Haeshin; Choi, SH; Park, TG, MACROMOLECULES, v.39, no.1, pp.23 - 25, 2006-01 |
Do-It-Yourself Pyramidal Mold for Nanotechnology Yun, Changsuk; Kang, Hosuk; Kwak, Juhyoun; Hwang, Seongpil, ACS OMEGA, v.4, no.11, pp.14599 - 14604, 2019-09 |
Dual patterning and sequential functionalization of block copolymers using photocrosslinkable random copolymer film Ku, Se-Jin; Kim, Su-Min; Kim, Jin-Baek, NANOTECHNOLOGY, v.20, no.28, 2009-07 |
Local pH-Responsive Diazoketo-Functionalized Photoresist for Multicomponent Protein Patterning Yun, Je Moon; Ganesan, Ramakrishnan; Choi, Jae-Hak; Kim, Jin-Baek, ACS APPLIED MATERIALS & INTERFACES, v.5, no.20, pp.10253 - 10259, 2013-10 |
Microseale metal patterning using photosensitive silver organometallic compounds Kim, JY; Son, HJ; Byun, YH; Lee, SY; Hwang, EC; Song, KY; Noh, CH; et al, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS REVIEW PAPERS, v.44, no.2, pp.865 - 868, 2005-02 |
Nanoporous hard etch masks using silicon-containing block copolymer thin films Ku, Se-Jin; Kim, Su-Min; Bak, Chang-Hong; Kim, Jin-Baek, POLYMER, v.52, no.1, pp.86 - 90, 2011-01 |
Non-chemically amplified resists containing polyhedral oligomeric silsesquioxane for a bilayer resist system Woo, Seung A.; Choi, Soo Young; Kim, Jin-Baek, POLYMER, v.98, pp.336 - 343, 2016-08 |
Novel photobleachable deep UV resists based on single component nonchemically amplified resist system Kim, Jin-Baek; Kim, KS, MACROMOLECULAR RAPID COMMUNICATIONS, v.26, no.17, pp.1412 - 1417, 2005-09 |
Novel top-surface imaging process by selective chemisorption of poly(dimethyl siloxane) on diazoketo-functionalized single component photoresist Ganesana, Ramakrishnan; Youna, Seul-Ki; Kim, Jin-Baek, MACROMOLECULAR RAPID COMMUNICATIONS, v.29, no.5, pp.437 - 441, 2008-03 |
One-Step Modification of Superhydrophobic Surfaces by a Mussel-Inspired Polymer Coating Kang, SM; You, I; Cho, WK; Shon, HK; Lee, TG; Choi, Insung; Karp, JM; et al, ANGEWANDTE CHEMIE-INTERNATIONAL EDITION, v.49, no.49, pp.9401 - 9404, 2010 |
Photoactive Diazoketo-Functionalized Self-Assembled Monolayer for Biomolecular Patterning Ganesan, Ramakrishnan; Lee, Hyun-Jung; Kim, Jin-Baek, LANGMUIR, v.25, no.16, pp.8888 - 8893, 2009-08 |
Room temperature processable organic-inorganic hybrid photolithographic materials based on a methoxysilane cross-linker Park, Ji Young; Kim, Jin-Baek, POLYMER JOURNAL, v.40, no.7, pp.663 - 666, 2008 |
Self-assembled silver nanoprisms monolayers at the liquid/liquid interface Lee, KY; Kim, MJ; Kwon, SS; Han, Sang Woo, MATERIALS LETTERS, v.60, no.13-14, pp.1622 - 1624, 2006-06 |
Simple fabrication of patterned gold nanoparticle arrays on functionalized block copolymer thin films Ku, Se-Jin; Woo, Seung-A; Seo, Dae-Ha; Song, Hyun-Joon; Kim, Jin-Baek, EUROPEAN POLYMER JOURNAL, v.47, no.3, pp.305 - 310, 2011-03 |
Simple micropatterning of biomolecules on a diazoketo-functionalized photoresist Ganesan, R; Yoo, SY; Choi, JH; Lee, SangYup; Kim, Jin-Baek, JOURNAL OF MATERIALS CHEMISTRY, v.18, no.6, pp.703 - 709, 2008-01 |
SiO(2) nanodot arrays using functionalized block copolymer templates and selective silylation Kim, Su-Min; Ku, Se-Jin; Kim, Jin-Baek, NANOTECHNOLOGY, v.21, no.23, 2010-06 |
Soft Graphoepitaxy of Block Copolymer Assembly with Disposable Photoresist Confinement Jeong, Seong-Jun; Kim, Ji-Eun; Moon, Hyoung-Seok; Kim, Bong-Hoon; Kim, Su-Min; Kim, Jin-Baek; Kim, Sang-Ouk, NANO LETTERS, v.9, no.6, pp.2300 - 2305, 2009-06 |
Surface-induced photoreaction of benzyl phenyl sulfide monolayers on silver and its application to preparing patterned binary monolayers Lee, I; Han, Sang Woo; Kim, CH; Kim, TG; Joo, SW; Jang, DJ; Kim, K, LANGMUIR, v.16, no.26, pp.9963 - 9967, 2000-12 |
Synthesis and polymerization of 3-(t-butoxycarbonyl)-1-vinylcaprolactam and application as deep UV resists Kim, Jin-Baek; Jung, MH; Chang, KH, POLYMER BULLETIN, v.38, no.3, pp.241 - 247, 1997-03 |
Synthesis of a novel methacrylate, (1,4-dioxa-8-methacrylate amide spiro [4,5] decane) monomer and its co-polymerization with t-butyl-3 alpha-methacryloxy-7 alpha, 12 alpha-dihydroxy-5 beta cholan-24-oate for 193 nm photoresist Karak, N; Ko, JS; Kim, Jin-Baek, JOURNAL OF POLYMER MATERIALS, v.19, pp.365 - 372, 2002-12 |
Ultrahigh density sub-10 nm TiO2 nanosheet arrays with high aspect ratios via the spacer-defined double-patterning process Bak, Chang Hong; Ku, Se-Jin; Jo, Gyeongcheon; Jung, Kyoung Ok; Lee, Ha Jin; Kwon, Se Hun; Kim, Jin-Baek, POLYMER, v.60, pp.267 - 273, 2015-03 |
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