RIMS Journal Papers

Recent Items

Collection's Items (Sorted by Submit Date in Descending order): 1841 to 1860 of 4799

1841
Inertia in Routines: A Hidden Source of Organizational Variation

Yi, Sangyoon; Knudsen, Thorbjorn; Becker, Markus C., ORGANIZATION SCIENCE, v.27, no.3, pp.782 - 800, 2016-05

1842
Diverse morphologies of self-aggregates from dodecyl chain grafted poly(2-hydroxyethyl aspartamide) in aqueous solution

An, Eun Jung; Jang, Kwang-Suk, MACROMOLECULAR RESEARCH, v.24, no.10, pp.887 - 891, 2016-10

1843
Returns, correlations, and volatilities in equity markets: Evidence from six OECD countries during the US financial crisis

Kim, Hyun-Seok; Min, Hong-Ghi; McDonald, Judith A., ECONOMIC MODELLING, v.59, pp.9 - 22, 2016-12

1844
상호선택 및 학습모델에서 노이즈의 역할

Kwon, Yongha; Ahn, Jungsoo; Yang, Jae-Suk; Kim, Ji-Hyun, 동서연구, v.28, no.2, pp.151 - 174, 2016-06

1845
A passivity criterion for real-time haptic simulation of viscoelastic soft tissues

Son, Hyoung Il; Bhattacharjee, Tapomayukh, PROCEEDINGS OF THE INSTITUTION OF MECHANICAL ENGINEERS PART I-JOURNAL OF SYSTEMS AND CONTROL ENGINEERING, v.230, no.9, pp.1062 - 1071, 2016-10

1846
Peer Group Effect in Firm Cash Holding Policy: Evidence from Korean Manufacturing Firms

Joo, Changlim; Yang, Insun; Yang, Taeyong, ASIA-PACIFIC JOURNAL OF FINANCIAL STUDIES, v.45, no.4, pp.535 - 573, 2016-08

1847
Compression of Hamiltonian matrix: Application to spin-1/2 Heisenberg square lattice

Choi, Seongsoo; Kim, Woohyun; Kim, Jongho, AIP ADVANCES, v.6, no.9, 2016-09

1848
MODEL FOR BULK EFFECTS ON SI INTERSTITIAL DIFFUSIVITY IN SILICON

GRIFFIN, PB; AHN, ST; TILLER, WA; PLUMMER, JD, APPLIED PHYSICS LETTERS, v.51, no.2, pp.115 - 117, 1987-07

1849
A STUDY OF SILICON INTERSTITIAL KINETICS USING SILICON MEMBRANES - APPLICATIONS TO 2D DOPANT DIFFUSION

Ahn, SungTae; GRIFFIN, PB; SHOTT, JD; PLUMMER, JD; TILLER, WA, JOURNAL OF APPLIED PHYSICS, v.62, no.12, pp.4745 - 4755, 1987-12

1850
EFFECT OF OXYGEN PRECIPITATION ON PHOSPHORUS DIFFUSION IN CZOCHRALSKI SILICON

AHN, ST; KENNEL, HW; PLUMMER, JD; TILLER, WA; REK, ZU; STOCK, SR, APPLIED PHYSICS LETTERS, v.53, no.1, pp.34 - 36, 1988-07

1851
A STAINING TECHNIQUE FOR THE STUDY OF TWO-DIMENSIONAL DOPANT DIFFUSION IN SILICON

Ahn, SungTae; TILLER, WA, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.135, no.9, pp.2370 - 2373, 1988-09

1852
ENHANCED SB DIFFUSION IN SI UNDER THERMAL SI3N4 FILMS DURING ANNEALING IN AR

Ahn, SungTae; KENNEL, HW; PLUMMER, JD; TILLER, WA, APPLIED PHYSICS LETTERS, v.53, no.17, pp.1593 - 1595, 1988-10

1853
FILM STRESS-RELATED VACANCY SUPERSATURATION IN SILICON UNDER LOW-PRESSURE CHEMICAL VAPOR-DEPOSITED SILICON-NITRIDE FILMS

Ahn, SungTae; KENNEL, HW; PLUMMER, JD; TILLER, WA, JOURNAL OF APPLIED PHYSICS, v.64, no.10, pp.4914 - 4919, 1988-11

1854
VACANCY SUPERSATURATION IN SI UNDER SIO2 CAUSED BY SIO FORMATION DURING ANNEALING IN AR

AHN, ST; KENNEL, HW; TILLER, WA; PLUMMER, JD, JOURNAL OF APPLIED PHYSICS, v.65, no.8, pp.2957 - 2963, 1989-04

1855
REDUCTION OF LATERAL PHOSPHORUS DIFFUSION IN CMOS NORMAL-WELLS

Ahn, SungTae; KENNEL, HW; PLUMMER, JD; TILLER, WA, IEEE TRANSACTIONS ON ELECTRON DEVICES, v.37, no.3, pp.806 - 807, 1990-03

1856
A NOVEL LOCAL OXIDATION OF SILICON (LOCOS)-TYPE ISOLATION TECHNOLOGY FREE OF THE FIELD OXIDE THINNING EFFECT

PARK, TS; AHN, SJ; AHN, ST, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.33, no.1B, pp.435 - 439, 1994-01

1857
EFFECT OF THE SILICIDATION REACTION CONDITION ON THE GATE OXIDE INTEGRITY IN TI-POLYCIDE GATE

LEE, NI; KIM, YW; AHN, ST, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.33, no.1B, pp.672 - 677, 1994-01

1858
AL-REFLOW PROCESS WITH A CAP-CLAMP FOR SUBMICRON CONTACT HOLES

CHOI, GH; LEE, SI; PARK, CS; PARK, IS; AHN, ST; KIM, YK; REYNOLDS, R, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.34, no.2B, pp.1026 - 1029, 1995-02

1859
DEPOSITION AND ELECTRICAL CHARACTERIZATION OF VERY THIN SRTIO3 FILMS FOR ULTRA LARGE-SCALE INTEGRATED DYNAMIC RANDOM-ACCESS MEMORY APPLICATION

HWANG, CS; PARK, SO; KANG, CS; CHO, HJ; KANG, HK; AHN, ST; LEE, MY, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.34, no.9B , pp.5178 - 5183, 1995-09

1860
Mobile services with handset bundling and governmental policies for competitive market

Kang, Dongsuk; Park, Min Jae; Lee, Duk-Hee; Rho, Jae Jeung, TELEMATICS AND INFORMATICS, v.34, no.1, pp.323 - 337, 2017-02

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