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Showing results 1 to 7 of 7

1
(A) study on the atomic layer deposition of Ir and $IrO_2$ thin films = Iridium과 Iridium Oxide 박막의 ALD 증착 및 특성에 관한 연구link

Kim, Sung-Wook; 김성욱; et al, 한국과학기술원, 2007

2
ECR PE-MOCVD법에 의해 증착된 $PbTiO_3$, PLT 박막의 특성에 관한 연구 = A study on the characteristics of $PbTiO_3$, PLT thin films deposited by ECR PE-MOCVDlink

정성웅; Chung, Sung-Woong; et al, 한국과학기술원, 1996

3
ECR-PECVD 법으로 제조한 PZT 박막의 물성 연구 = Characteriszation of PZT thin films prepared by ECR-PECVDlink

김재환; Kim, Jae-Whan; 위당문; 이원종; et al, 한국과학기술원, 1996

4
Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition

Jeong, Seong-Jun; Kim, Doo-In; Kim, Sang Ouk; Han, Tae Hee; Kwon, Jung-Dae; Park, Jin-Seong; Kwon, Se-Hun, JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.11, no.1, pp.671 - 674, 2011-01

5
Ir 하부전극 위에서 PEALD로 증착 된 TiAlO 박막의 특성에 대한 연구 = A study on TiAlO films deposited by plasma enhanced atomic layer depositionlink

주대권; Joo, Dae-Kwon; et al, 한국과학기술원, 2009

6
(Pb,La)(Zr,Ti)O-3 thin films prepared by electron cyclotron resonance plasma enhanced chemical vapor deposition for the charge storage capacitor of a gigabit-scale dynamic random access memory

Shin, JS; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.37, no.1, pp.198 - 203, 1998-01

7
The effects of substrate temperature and lead precursor flow rate on the fabrication of (Pb,La)(Zr,Ti)O-3 thin films by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Shin, JS; Chun , Soung Soon; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.36, no.4A, pp.2200 - 2206, 1997-04

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