| 12301 | RBS Measurements of GexSi1-x/Si(100) Crystals Grown by Solid Phase Epitaxy by Using an a-Ge/Au/Si(100) Structure H.S. Kim; J.J. Lee; K.H. Kim; T.G. Im; C.K. Choi; J.Y. Lee, 응용물리, v.10, no.3, pp.252 - 257, 1997-12 |
| 12302 | RBS Studies on Ti, Ni and Zr Diffusion in Polyimide Paik, Kyung-Wook, Proc. Mat. Res. Soc. Symp, pp.143 - 148, 1989-02-01 |
| 12303 | Re-entrant relaxor ferroelectricity of methylammonium lead iodide Guo, Haiyan; Liu, Peixue; Zheng, Shichao; Zeng, Shixian; Liu, Na; Hong, Daniel Seungbum, CURRENT APPLIED PHYSICS, v.16, no.12, pp.1603 - 1606, 2016-12 |
| 12304 | (RE-magnetron Sputtering법으로) Glass위에 증착된 PLT 박막의 후열처리에 따른 특성 노광수; 강승국; 박명식; 조상희, 한국요업학회 추계학술발표대회, 한국요업학회, 1997-01-01 |
| 12305 | Reaction characteristics between Cu thin film and RF inductively coupled Cl-2 plasma without/with UV irradiation Kwon, MS; Lee, JeongYong; Choi, KS; Han, CH, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.37, no.7, pp.4103 - 4108, 1998-07 |
| 12306 | Reaction mechanism of low-temperature Cu dry etching using an inductively coupled Cl-2/N-2 plasma with ultraviolet light irradiation Kwon, MS; Lee, JeongYong, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.146, no.8, pp.3119 - 3123, 1999-08 |
| 12307 | Reaction of Terfenol-D melts with SiO2 crucibles Kwon, Y; Kwon, O; Kim, M; Wee, Dang-Moon, MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, v.129, no.1-3, pp.18 - 21, 2006-04 |
| 12308 | Reaction Path of Cu2ZnSnS4 Nanoparticles by a Solvothermal Method Using Copper Acetate, Zinc Acetate, Tin Chloride and Sulfur in Diethylenetriamine Solvent Cghalapathy, RBV; Jung, Gwangsun; Ko, Young Min; Ahn, Byung Tae; Kwon, Hyuk-Sang, Current Photovoltaic Research, v.1, no.2, pp.109 - 114, 2013-06 |
| 12309 | Reaction sintering of dense LATP solid-state electrolyte ceramics for all-solid-state lithium-ion batteries = 전고체 리튬 이온 전지용 고밀도 LATP 고체 전해질 세라믹의 반응 소결link Kim, Dong Gyu; Kim, Do Kyung; et al, 한국과학기술원, 2019 |
| 12310 | Reaction Sintering Process and Characterization of NASICON Solid Electrolyte Ceramics = NASICON 고체 전해질 세라믹스의 반응 소결 공정 및 특성 평가link Jung, Sewoon; Kim, Do Kyung; et al, 한국과학기술원, 2017 |
| 12311 | Reaction synthesis and microstructures of NiAl/Ni micro-laminated composites Kim, HY; Chung, DS; Hong, Soon-Hyung, MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, v.396, pp.376 - 384, 2005-04 |
| 12312 | Reaction-Based Processing Methods for Ceramics and Composites ; Ceramic-Matrix Composites Fabricated by the Lanxide Process 김도경; 이성, 세라미스트, v.6, no.3, pp.182 - 189, 1991-03 |
| 12313 | Reaction-sintered LAGP solid electrolytes with MoS2 coating for improved stability with Li metal Baek, Seung Jin; Cha, Eunho; Kim, Dong Gyu; Yun, Jong Hyuk; Kim, Do Kyung, CERAMICS INTERNATIONAL, v.48, no.23, pp.34828 - 34836, 2022-12 |
| 12314 | REACTIVE HOT PRESSING AND OXIDATION BEHAVIOR OF Hf-BASED ULTRA-HIGH-TEMPERATURE CERAMICS Lee, Seung-Jun; Kang, Eul-Son; Baek, Seung-Su; Kim, Do-Kyung, SURFACE REVIEW AND LETTERS, v.17, no.2, pp.215 - 221, 2010-04 |
| 12315 | Reactive ion etching mechanism of copper film in chlorine-based electron cyclotron resonance plasma Lee, SK; Chun , Soung Soon; Hwang, CY; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.36, no.1A, pp.50 - 55, 1997-01 |
| 12316 | REACTIVE ION ETCHING MECHANISM OF PLASMA-ENHANCED CHEMICALLY VAPOR-DEPOSITED ALUMINUM-OXIDE FILM IN CF4/O-2 PLASMA KIM, JW; KIM, YC; Lee, Won-Jong, JOURNAL OF APPLIED PHYSICS, v.78, no.3, pp.2045 - 2049, 1995-08 |
| 12317 | Reactive ion etching mechanism of RuO2 thin films in oxygen plasma with the addition of CF4, Cl-2, and N-2 Lee, EJ; Kim, JW; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.37, no.5A, pp.2634 - 2641, 1998-05 |
| 12318 | Reactive magnetron sputter ion plating법에 의해 증착된 TiN 박막의 특성에 관한 연구 = A study on characteristics of the TiN thin films deposited by reactive magnetron sputter ion plating.link 강희수; Kang, Hee-Soo; et al, 한국과학기술원, 1996 |
| 12319 | Reactive magnetron sputter ion plating법으로 증착된 TiN 박막의 증착 특성 및 침식 특성에 관한 연구 = Deposition characteristics and liquid impingement erosion properties of TiN film fabricated by reactive magnetron sputter ion platinglink 이민구; Lee, Min-Ku; et al, 한국과학기술원, 1998 |
| 12320 | Reactive multi-target sputtering 법으로 증착된 P(L)ZT 박막의 제조 특성및 기억소자로의 응용에 관한 연구 = Deposition characteristics of P(L)ZT ferroelectric film fabricated by reactive multi-target sputtering method and its applications for memory deviceslink 김현호; Kim, Hyun-Ho; et al, 한국과학기술원, 1999 |
