Browse "Dept. of Materials Science and Engineering(신소재공학과)" by Title 

Showing results 11621 to 11640 of 19268

11621
Planar Circular Magnetron Sputtering 에서의 두께 균일도에 대한 모델 연구

노광수, 한국요업학회 추계발표대회, 한국요업학회, 1995-01-01

11622
Planar metalens and cover glass including the same

Shin, Jonghwa; Chang, Taeyong

11623
Plane strain compression of single crystalline Ni3Al-base intermetallic compounds

Song, SH; Kishida, K; Demura, M; Oh, MH; Wee, Dang-Moon; Hirano, T, ICOTOM 14: TEXTURES OF MATERIALS, PTS 1AND 2 BOOK SERIES: MATERIALS SCIENCE FORUM, v.495-497, pp.772 - 12, 2005

11624
Plane wave model법에 의한 거대자기변형 복합재료의 동적 자기기계 특성 해석 및 와전류의 영향 규명 = Dynamic magnetomechanical properties and effect of eddy currents on giant magnetostrictive composites obtained by plane wave modelling techniquelink

이세훈; Lee, Se-Hoon; et al, 한국과학기술원, 2005

11625
Plant-transpiration Inspired Electrokinetic Power Generation

Bae, Jaehyeong; Kim, Il-Doo, The 5th International Conference on Advanced Electromaterials, International Conference on Advanced Electromaterials, 2019-11-05

11626
Plasma 소결조건이 알루미나 요업체의 소결거동과 미세구조에 미치는 효과

Kim, Chong Hee, 한국요업학회, 1990

11627
Plasma Activated Evaporation 방법에 의해 증착된 Copper Phthalocyanine 박막의 NOx 농도측정에 관한 연구

이원종; 최창구; 장성수, 한국재료학회 추계학술연구발표회, pp.0 - 0, 1993-01-01

11628
Plasma display panel and low temperature fabrication method thereof

배병수, 2011-01-11

11629
Plasma Doping Strategy for Few-layer Transition Metal Dichalcogenides by Self-assembled Protective Nanostructures

Yim, Soonmin; Jung, Yeon Sik, 제23회 한국 반도체 학술대회, 한국반도체학회, 2016-02-24

11630
Plasma doping technology for fabrication of nanoscale metal-oxide-semiconductor devices

Cho, Won-ju; Im, Kiju; Ahn, Chang-Geun; Yang, Jong-Heon; Oh, Jihun; Baek, In-Bok; Lee, Seongjae, Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, v.22, no.6, pp.3210 - 3213, 2004-11

11631
Plasma Enhanced Atomic Layer Deposition of SrTiO3 Thin Films Using Sr(DPM)2 and TTIP

KANG SANG WON, 5th International AVS Conference on Microelectronics and Interfaces, pp.0 - 0, 2004-02-01

11632
Plasma Enhanced Atomic Layer Deposition of Ta-N films using TaF5 with N2/H2/Ar mixed gas plasma

KANG SANG WON, 5th International AVS Conference on Microelectronics and Interfaces, pp.107 - 109, 2004-02-01

11633
Plasma Enhanced Atomic Layer Deposition of Ta-N films using TaF5 with N2/H2/Ar mixed gas plasma

KANG SANG WON, Atomic Layer Deposition (ALD) 2004, pp.0 - 0, 2004-08-01

11634
Plasma enhanced atomic layer deposition of transition metal nitrides (Invited talk)

Kang, Sang-Won, Atomic Layer Deposition conference, ALD, 2001-05

11635
Plasma enhanced chemically vapor deposited aluminum oxide films as a new etch mask material for microelectronic fabrication

이원종, KOREAN APPLIED PHYSICS, v.7, no.4, pp.289 - 296, 1994-04

11636
Plasma Enhanced CVD 방법으로 제조한 $C_(1-x)$ $N_x$ nanotube에 Co, P를 doping한 촉매의 미세구조와 알칼리 $NaBH_4$ 용액에서의 수소발생특성에 관한 연구 = A study on the microstructures of catalysts doping Co, P components in $C_(1-x)$$N_x$ nanotubes prepared by PECVD and their hydrogen generation properties by hydrolysis of $NaBH_4$link

송철옥; Song, Cheol-Ock; et al, 한국과학기술원, 2008

11637
Plasma enhanced CVD 방법으로 제조한 $C_{1-X}N_X$ nanotubes의 구조변화에 따른 수소저장특성에 관한 연구 = A study on the hydrogen storage porperty of $C_{1-X}N_X$ nanotubes prepared by PECVD with their nano-structural changelink

김현석; Kim, Hyun-Seok; 강정구; Kang, Jeung-Ku; et al, 한국과학기술원, 2006

11638
Plasma Sintering of Al2O3-B4C Composite

Kim, Do Kyung; Moon, YT; Kim, WJ; Kim, CH, JOURNAL OF MATERIALS SYNTHESIS AND PROCESSING, v.3, no.2, pp.115 - 120, 1995-04

11639
Plasma Sprayed Deposition of Al-Ti-Cr Coating for Oxidation Protection of TiAl Alloys

Wee, Dang-Moon, pp.0 - 0, 2002-01-01

11640
Plasma 소결 조건이 알루미나 요업체의 소결거동과 미세구조에 미치는 효과 = Effect of plasma sintering conditions on sintering behavior and microstructure of alumina ceramicslink

문영태; Mun, Yung-Tae; et al, 한국과학기술원, 1990

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