DSpace at KOASAS: Plasma Enhanced Atomic Layer Deposition of Ta-N films using TaF5 with N2/H2/Ar mixed gas plasma

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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Conference Papers(학술회의논문)

Plasma Enhanced Atomic Layer Deposition of Ta-N films using TaF5 with N2/H2/Ar mixed gas plasma

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KANG SANG WON researcher

Issue Date: 2004-02-01

Language: ENG

Citation: 5th International AVS Conference on Microelectronics and Interfaces, pp.107 - 109

URI: http://hdl.handle.net/10203/143197

Appears in Collection: MS-Conference Papers(학술회의논문)

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