Thermally Induced Deformation Measurement of Through-Silicon Via (TSV) Structures using an Atomic Force Microscope (AFM) Moiré Method

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Publisher
IEEE
Issue Date
2012-08-20
Language
English
Citation

IEEE Nano 2012

URI
http://hdl.handle.net/10203/169815
Appears in Collection
ME-Conference Papers(학술회의논문)
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