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Showing results 1 to 26 of 26

1	A new inside-type segmented coil antenna for uniformity control in a large-area inductively coupled plasma Lee, Pyung-Woo; Kim, Sung-Sik; Seo, Sang-Hun; Chang, Choong-Seock; Chang, Hongyoung; Ichiki,Takanori; Horiike,Yasuhiro, JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, v.39, no.6A, pp.548 - 550, 2000-06
2	A novel pulsing method for the enhancement of the deposition rate in high power pulsed magnetron sputtering In, Jung-Hwan; Seo, Sang-Hun; Chang, Hong-Young, SURFACE COATINGS TECHNOLOGY, v.202, no.22-23, pp.5298 - 5301, 2008-08
3	Capacitive Electron Cooling in an Inductively Coupled Plasma Source/Capacitively Coupled Plasma Bias Reactor Jun, Hyun-Su; Lee, Dong-Seok; Chang, Hong-Young, JAPANESE JOURNAL OF APPLIED PHYSICS, v.52, no.10, 2013-10
4	Characterization of a high-frequency inductively coupled plasma source Lee, DS; Jun, HS; Chang, Hong-Young, THIN SOLID FILMS, v.506, pp.469 - 473, 2006-05
5	Control of ion species in inductively coupled oxidation plasma by inert gas mixing Bai, KH; Chang, Hong-Young, JOURNAL OF APPLIED PHYSICS, v.100, pp.443 - 448, 2006-12
6	Effect of negative ions on filamentation instability in collisionless three-fluid theory of plasmas with cold ion species Cho, GS; Lee, JY; Kong, Hong-Jin, PHYSICS OF PLASMAS, v.3, no.8, pp.3182 - 3184, 1996-08
7	Effect of reactor surface modification on the neutral gas temperature in a transformer-coupled toroidal plasma You, Daeho; Lee, Yun-Seong; Lee, Jeong Beom; Chang, Hong-Young, CURRENT APPLIED PHYSICS, v.15, no.3, pp.183 - 189, 2015-03
8	Effective design of multiple hollow cathode electrode to enhance the density of rf capacitively coupled plasma Lee, Hun-Su; Lee, Yun-Seong; Seo, S. H.; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.97, no.8, 2010-08
9	Effects of substrate bias voltage on plasma parameters in temperature control using a grid system Bai, KH; Hong, JI; You, SJ; Chang, Hong-Young, PHYSICS OF PLASMAS, v.8, no.9, pp.4246 - 4250, 2001-09
10	Electrical characteristics of helicon wave plasmas Yun, SM; Kim, JH; Chang, Hong-Young, IEEE TRANSACTIONS ON PLASMA SCIENCE, v.26, no.2, pp.159 - 166, 1998-04
11	Electron temperature analysis of two-gas-species inductively coupled plasma Bai, KH; Chang, Hong-Young; Uhm, HS, APPLIED PHYSICS LETTERS, v.79, no.11, pp.1596 - 1598, 2001-09
12	Electron temperature control with grid bias in inductively coupled argon plasma Hong, JI; Seo, SH; Kim, SS; Yoon, NS; Chang, Choong-Seock; Chang, Hong-Young, PHYSICS OF PLASMAS, v.6, no.3, pp.1017 - 1028, 1999-03
13	Highly selective SiO2 etching in low-electron-temperature inductively coupled plasma Bai, KH; Chang, Hong-Young; Kwon, GC; Kim, HS; Kim, JS, JAPANESE JOURNAL OF APPLIED PHYSICS, v.46, pp.3602 - 3604, 2007-06
14	Inductively coupled plasma heating in a weakly magnetized plasma Chang, Choong-Seock, PHYSICS OF PLASMAS, v.6, no.7, pp.2926 - 2935, 1999-01
15	Leaf Vein-Inspired Electrospraying System by Grafting Origami Seo, Young Chang; You, In-Seong; Park, Inyong; Kim, Sang Soo; Lee, Haeshin, CHEMISTRY OF MATERIALS, v.28, no.21, pp.7990 - 7996, 2016-11
16	Mutual Conservation of Redox Mediator and Singlet Oxygen Quencher in Lithium-Oxygen Batteries Kwak, Won-Jin; Freunberger, Stefan A.; Kim, Hun; Park, Jiwon; Trung Thien Nguyen; Jung, Hun-Gi; Byon, Hye Ryung; et al, ACS CATALYSIS, v.9, no.11, pp.9914 - 9922, 2019-11
17	On inductively coupled plasmas for next-generation processing Lee, YK; Lee, DS; Bai, KH; Chung, CW; Chang, Hong-Young, SURFACE COATINGS TECHNOLOGY, v.169, pp.20 - 23, 2003-06
18	Plasma parameters analysis of various mixed gas inductively coupled plasmas Bai, KH; You, SJ; Chang, Hong-Young; Uhm, HS, PHYSICS OF PLASMAS, v.9, no.6, pp.2831 - 2838, 2002-06
19	Power dissipation mode transition by a magnetic field You, SJ; Chung, CW; Bai, KH; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.81, no.14, pp.2529 - 2531, 2002-09
20	Pressure and helium mixing effects on plasma parameters in temperature control using a grid system Bai, KH; Hong, JI; Chung, CW; Kim, SS; Chang, Hong-Young, PHYSICS OF PLASMAS, v.8, no.7, pp.3498 - 3501, 2001-07
21	Promoting Formation of Noncrystalline Li2O2 in the Li-O-2 Battery with RuO2 Nanoparticles Yilmaz, Eda; Yogi, Chihiro; Yamanaka, Keisuke; Ohta, Toshiaki; Byon, Hye Ryung, NANO LETTERS, v.13, no.10, pp.4679 - 4684, 2013-10
22	Si etching rate calculation for low pressure high density plasma source using Cl-2 gas Lee, YD; Chang, Hong-Young; Chang, Choong-Seock, JOURNAL OF VACUUM SCIENCE TECHNOLOGY A-VACUUM SURFACES AND FILMS, v.18, no.5, pp.2224 - 2229, 2000
23	Study on the mode transitions for rf power dissipation in capacitively coupled plasma You, SJ; Ahn, SK; Chang, Hong-Young, SURFACE & COATINGS TECHNOLOGY, v.193, pp.81 - 87, 2005-04
24	Sulfur-Based Catholyte Solution with a Glass-Ceramic Membrane for Li-S Batteries Wang, Lina; Zhao, Yu; Thomas, Morgan L.; Dutta, Arghya; Byon, Hye Ryung, CHEMELECTROCHEM, v.3, no.1, pp.152 - 157, 2016-01
25	Temporal evolution of electron energy distribution function and plasma parameters in the afterglow of drifting magnetron plasma Seo, SH; In, JH; Chang, Hong-Young, PLASMA SOURCES SCIENCE & TECHNOLOGY, v.14, pp.576 - 580, 2005-08
26	Time evolution of electronegativity in a pulsed inductively coupled oxygen plasma Lee, Jeong-Beom; Seo, Sang-Hun; Chang, Hong-Young, THIN SOLID FILMS, v.518, pp.6573 - 6577, 2010-09

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