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Showing results 33781 to 33800 of 275953
| Atomic layer deposited metal gate stack for logic and memory devices = 로직 및 메모리 소자를 위한 원자층 증착법을 이용한 금속 게이트 스택link Moon, Jungmin; Cho, Byung Jin; et al, 한국과학기술원, 2018 |
| Atomic layer deposited molybdenum disulfide on Si photocathodes for highly efficient photoelectrochemical water reduction reaction Oh, Seungtaeg; Kim, Jun Beom; Song, Jun Tae; Oh, Jihun; Kim, Soo-Hyun, JOURNAL OF MATERIALS CHEMISTRY A, v.5, no.7, pp.3304 - 3310, 2017 |
| Atomic layer deposited p-type copper oxide thin films and the associated thin film transistor properties Maeng, Wanjoo; Lee, Seung-Hwan; Kwon, Jung-Dae; Park, Jozeph; Park, Jin-Seong, CERAMICS INTERNATIONAL, v.42, no.4, pp.5517 - 5522, 2016-03 |
| Atomic Layer Deposition Assisted Pattern Multiplication of Block Copolymer Lithography for 5 nm Scale Nanopatterning Moon, Hyoung Seok; Kim, Juyoung; Jin, Hyeong Min; Lee, Woo Jae; Choi, Hyeon Jin; Mun, Jeong Ho; Choi, Young Joo; et al, ADVANCED FUNCTIONAL MATERIALS, v.24, no.27, pp.4343 - 4348, 2014-07 |
| Atomic layer deposition assisted sacrificial template synthesis of mesoporous TiO2 electrode for high performance lithium ion battery anodes Hong, Ki Joo; Kim, Sang Ouk, ENERGY STORAGE MATERIALS, v.2, pp.27 - 34, 2016-01 |
| Atomic Layer Deposition Encapsulated Activated Carbon Electrodes for High Voltage Stable Supercapacitors Hong, Ki Joo; Cho, Moonkyu; Kim, Sang-Ouk, ACS APPLIED MATERIALS INTERFACES, v.7, no.3, pp.1899 - 1906, 2015-01 |
| Atomic layer deposition of Al2O3 thin films using trimethylaluminum and isopropyl alcohol Jeon, WS; Yang, S; Lee, CS; Kang, Sang-Won, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.149, no.6, pp.306 - 310, 2002-06 |
| Atomic Layer Deposition of Aluminum Thin Films Using an Alternating Supply of Trimethylaluminum and a Hydrogen Plasma Lee, Yong Ju; Kang, Sang-Won, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.5, no.10, pp.C91 - C93, 2002-08 |
| Atomic layer deposition of copper thin film using Cu II(diketoiminate)2 and H2 Han B.; Parka K.-M.; Park K.; Park J.-W.; Lee W.-J., 2009 IEEE International Interconnect Technology Conference, IITC 2009, pp.173 - 174, 2009-06-01 |
| Atomic layer deposition of environmentally benign SnTiOx as a potential ferroelectric material Chang, Siliang; Selvaraj, Sathees Kannan; Choi, Yoon-Young; Hong, Seungbum; Nakhmanson, Serge M.; Takoudis, Christos G., JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.34, no.1, 2016-01 |
| Atomic layer deposition of highly conductive indium oxide using a liquid precursor and water oxidant Maeng, W. J.; Choi, Dong-won; Park, Jozeph; Park, Jin-Seong, CERAMICS INTERNATIONAL, v.41, no.9, pp.10782 - 10787, 2015-11 |
Atomic Layer Deposition of Inorganic Thin Films on 3D Polymer Nanonetworks Ahn, Jinseong; Ahn, Changui; Jeon, Seokwoo; Park, Junyong, APPLIED SCIENCES-BASEL, v.9, no.10, pp.1 - 17, 2019-05 |
| Atomic layer deposition of nickel and nickel germanide for next generation 3D devices = 차세대 3D 반도체 소자 적용을 위한 니켈의 원자층 증착 방법 공정 개발 및 니켈-저마나이드 형성link Ahn, Hyun Jun; Cho, Byung Jin; et al, 한국과학기술원, 2020 |
| Atomic layer deposition of nickel by the reduction of preformed nickel oxide Chae, Junghun; Park, Hyuong-Sang; Kang, Sang-Won, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.5, no.6, pp.C64 - C66, 2002-06 |
| Atomic Layer Deposition of Ru Thin Film Using a Newly Synthesized Precursor with Open-Coordinated Ligands Oh, Seung Hoon; Hwang, Jeong Min; Park, Hyeonbin; Park, Dongseong; Song, Young Eun; Ko, Eun Chong; Park, Tae Joo; et al, ADVANCED MATERIALS INTERFACES, v.10, no.17, 2023-06 |
| Atomic Layer Deposition of Ruthenium Glue Layer for Copper Damascene interconnect Kang, Sang-Won, 203rd ECS Meeting, ECS, 2003-04 |
| Atomic layer deposition of ruthenium thin films for copper glue layer Kwon, OK; Kim, JH; Park, HS; Kang, SW, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.151, no.2, pp.G109 - G112, 2004-01 |
| Atomic Layer Deposition of Silicon Nitride Thin Film Park, Chong-Ook; Lee, Joo-Hyeon; Kim, Hyuk; Lee, Yeon-Seong; Rha, Sa-Kyun; Lee, Won-Jun, AVS Topical Conference ALD 2002, pp.P-14 -, 2002 |
| Atomic layer deposition of silicon oxide thin films by alternating exposures to Si(2)Cl(6) and O(3) Lee, Seung-Won; Park, Kwangchol; Han, Byeol; Son, Sang-Ho; Rha, Sa-Kyun; Park, Chong-Ook; Lee, Won-Jun, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.11, no.7, pp.23 - 26, 2008 |
| Atomic Layer Deposition of TiN Thin Films by Alternate Supply of Tetrakis (ethymethylamino)-Titanium and Ammonia Min, Jae-Sik; Son, Young-Woong; Kang, Won-Gu; Chun, Soung-Soon; Kang, Sang-Won, JAPANESE JOURNAL OF APPLIED PHYSICS, v.37, no.0, pp.4999 - 5004, 1999 |
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