Atomic layer deposited metal gate stack for logic and memory devices = 로직 및 메모리 소자를 위한 원자층 증착법을 이용한 금속 게이트 스택

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Recently, 3D structures devices such as FinFETs and vertical NAND device have been actively adopted in logic and memory devices. The atomic layer deposition (ALD) process is necessary to realize the 3D structure devices. However, the properties of ALD metal electrode have not been extensively studied, especially for band-edge work function metal. In this dissertation, we investigated the properties of the metal gate stack prepared by ALD for logic and memory devices. The effective work function (eWF) of Al-doped titanium carbide (TiAlC) metal electrodes demonstrated using ALD method shows a strong dependency on the underlying gate dielectrics. The ALD TiAlC has a low work function on the $HfO_2$ dielectric regardless of the process conditions, indicating that an $ALD-TiAlC/HfO_2$ gate stack is a promising candidate for 3D nMOSFETs. The titanium nitride (TiN) deposition via ALD was also performed using titanium chloride for the PMOS applications. The ALD TiN has a high work the function regardless of dielectric materials, whereas its eWF is affected by upper low resistive metal. Additionally, the gate stacks using the formation of interface dipole were proposed to make the high work function of ALD TiN. In the 3D charge trap flash (CTF) device, the gate electrode is composed by chemical vapor deposition tungsten (CVD W) using WF6 source for a low resistance and ALD TiN for high work function metal. In this case, the memory device is inevitably degraded by fluorine diffusion along the grain boundaries of TiN. The CTF device with CVD W electrode shows that erase and retention properties are significantly affected by fluorine. In order to systematically study the effects of fluorine from the CVD W process, the mechanism of deterioration of the charge trap device was clarified and the memory reliability was analyzed.
Advisors
Cho, Byung Jinresearcher조병진researcher
Description
한국과학기술원 :전기및전자공학부,
Publisher
한국과학기술원
Issue Date
2018
Identifier
325007
Language
eng
Description

학위논문(박사) - 한국과학기술원 : 전기및전자공학부, 2018.2,[vii, 75 p. :]

Keywords

Atomic layer deposition▼achemical vapor deposition▼atungsten▼aeffective work function▼agate electrode▼alogic device▼amemory device▼atitanium carbide▼atitanium nitride; 게이트 전극▼a원자층 증착▼a일함수▼a질화티탄▼a탄화티탄▼a화학기상 증착▼a텅스텐▼a로직소자▼a메모리소자

URI
http://hdl.handle.net/10203/265273
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=734394&flag=dissertation
Appears in Collection
EE-Theses_Ph.D.(박사논문)
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