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Showing results 33821 to 33840 of 276390

33821
Atomic force microscopy study of Mn12O12(O2CC4H3S)(16)(H2O)(4) single-molecule magnet adsorbed on Au surface

Phark, Soohyon; Khim, ZheongG.; Kim, BeomJin; Suh, ByoungJin; Yoon, Seokwon; Kim, Jinkwon; Lim, JinMook; et al, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.43, no.12, pp.8273 - 8277, 2004-12

33822
Atomic force microscopy study of the mechanical and electrical properties of monolayer films of molecules with aromatic end groups

Fang, L; Park, JeongYoung; Ma, H; Jen, AKY; Salmeron, M, LANGMUIR, v.23, no.23, pp.11522 - 11525, 2007-11

33823
Atomic fountain towards a single atom trap

Kyungwon An, National Laser symposium, 2000

33824
Atomic fountain towards a single atom trap

안경원, 한국광학회 2000년도 하계학술발표회, pp.TC - 14, 2000

33825
Atomic Hydrogen Production from Semi-clathrate Hydrates

Koh, Dong-Yeun; Kang, Hye-Ry; Park, Ju-Woon; Shin, Woong-Chul; Lee, Huen, JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, v.134, no.12, pp.5560 - 5562, 2012-03

33826
Atomic Layer Deposiion of Ruthenium and Ruthenium Oxide for DRAM Capacitor Electrode

Kang, Sang-Won, 4th AVS International Conference on Microelectronics and Interfaces, ICMI, 2003-03

33827
Atomic layer deposited high-kappa films and their role in metal-insulator-metal capacitors for Si RF/analog integrated circuit applications

Zhu, CX; Cho, Byung Jin; Li, MF, CHEMICAL VAPOR DEPOSITION, v.12, no.2-3, pp.165 - 171, 2006-03

33828
Atomic layer deposited IrO-TiO thin film resistor for the thermal inkjet printheads

Kwon S.H.; Kirn S.W.; Jeong S.J.; Kim K.H.; Kang S.W., Atomic Layer Deposition Applications 4 - 214th ECS Meeting, pp.315 - 319, 123, 2008-10-13

33829
Atomic layer deposited metal gate stack for logic and memory devices = 로직 및 메모리 소자를 위한 원자층 증착법을 이용한 금속 게이트 스택link

Moon, Jungmin; Cho, Byung Jin; et al, 한국과학기술원, 2018

33830
Atomic layer deposited molybdenum disulfide on Si photocathodes for highly efficient photoelectrochemical water reduction reaction

Oh, Seungtaeg; Kim, Jun Beom; Song, Jun Tae; Oh, Jihun; Kim, Soo-Hyun, JOURNAL OF MATERIALS CHEMISTRY A, v.5, no.7, pp.3304 - 3310, 2017

33831
Atomic layer deposited p-type copper oxide thin films and the associated thin film transistor properties

Maeng, Wanjoo; Lee, Seung-Hwan; Kwon, Jung-Dae; Park, Jozeph; Park, Jin-Seong, CERAMICS INTERNATIONAL, v.42, no.4, pp.5517 - 5522, 2016-03

33832
Atomic Layer Deposition Assisted Pattern Multiplication of Block Copolymer Lithography for 5 nm Scale Nanopatterning

Moon, Hyoung Seok; Kim, Juyoung; Jin, Hyeong Min; Lee, Woo Jae; Choi, Hyeon Jin; Mun, Jeong Ho; Choi, Young Joo; et al, ADVANCED FUNCTIONAL MATERIALS, v.24, no.27, pp.4343 - 4348, 2014-07

33833
Atomic layer deposition assisted sacrificial template synthesis of mesoporous TiO2 electrode for high performance lithium ion battery anodes

Hong, Ki Joo; Kim, Sang Ouk, ENERGY STORAGE MATERIALS, v.2, pp.27 - 34, 2016-01

33834
Atomic Layer Deposition Encapsulated Activated Carbon Electrodes for High Voltage Stable Supercapacitors

Hong, Ki Joo; Cho, Moonkyu; Kim, Sang-Ouk, ACS APPLIED MATERIALS INTERFACES, v.7, no.3, pp.1899 - 1906, 2015-01

33835
Atomic layer deposition of Al2O3 thin films using trimethylaluminum and isopropyl alcohol

Jeon, WS; Yang, S; Lee, CS; Kang, Sang-Won, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.149, no.6, pp.306 - 310, 2002-06

33836
Atomic Layer Deposition of Aluminum Thin Films Using an Alternating Supply of Trimethylaluminum and a Hydrogen Plasma

Lee, Yong Ju; Kang, Sang-Won, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.5, no.10, pp.C91 - C93, 2002-08

33837
Atomic layer deposition of copper thin film using Cu II(diketoiminate)2 and H2

Han B.; Parka K.-M.; Park K.; Park J.-W.; Lee W.-J., 2009 IEEE International Interconnect Technology Conference, IITC 2009, pp.173 - 174, 2009-06-01

33838
Atomic layer deposition of environmentally benign SnTiOx as a potential ferroelectric material

Chang, Siliang; Selvaraj, Sathees Kannan; Choi, Yoon-Young; Hong, Seungbum; Nakhmanson, Serge M.; Takoudis, Christos G., JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.34, no.1, 2016-01

33839
Atomic layer deposition of highly conductive indium oxide using a liquid precursor and water oxidant

Maeng, W. J.; Choi, Dong-won; Park, Jozeph; Park, Jin-Seong, CERAMICS INTERNATIONAL, v.41, no.9, pp.10782 - 10787, 2015-11

33840
Atomic Layer Deposition of Inorganic Thin Films on 3D Polymer Nanonetworks

Ahn, Jinseong; Ahn, Changui; Jeon, Seokwoo; Park, Junyong, APPLIED SCIENCES-BASEL, v.9, no.10, pp.1 - 17, 2019-05

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