Atomic layer deposited IrO-TiO thin film resistor for the thermal inkjet printheads

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Publisher
123
Issue Date
2008-10-13
Language
English
Citation

Atomic Layer Deposition Applications 4 - 214th ECS Meeting, pp.315 - 319

ISSN
1938-5862
URI
http://hdl.handle.net/10203/157971
Appears in Collection
RIMS Conference Papers
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