나노 스테레오리소그래피 공정을 이용한 불투명 기판에서의 3차원 마이크로 형상 제작 방법에 관한 연구Direct Patterning of 3D Microstructures on an Opaque Substrate Using Nano- Stereolithography

Cited 0 time in webofscience Cited 0 time in scopus
  • Hit : 529
  • Download : 0
A nano-stereolithography is the direct patterning process with a nanoscale resolution using twophoton absorption induced by a femtosecond laser. However, in the majority of the works, the fabrication of 3D microstructures have been done only onto transparent glass due to the use of an oil immersion objective lens for achieving a high resolution. In this work, the coaxial illumination and the auto-focusing system are proposed for the direct patterning of nano-precision patterns on an opaque substrate such as a silicon wafer and a metal substrate. Through this work, 3D polymer structures and metallic patterns are fabricated on a silicon wafer using the developed process.
Publisher
한국정밀공학회
Issue Date
2010-10
Language
Korean
Citation

한국정밀공학회지, v.27, no.10, pp.93 - 99

ISSN
1225-9071
URI
http://hdl.handle.net/10203/97220
Appears in Collection
ME-Journal Papers(저널논문)
Files in This Item
There are no files associated with this item.

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0