Observation of V-shaped defects in the growth of In0.8Al0.2Sb/InSb layers: Temperature and V/III flux ratio dependences

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In0.8Al0.2Sb/InSb layers were grown under various growth temperature and V/III flux ratio conditions on semi-insulating (001)oriented GaAs substrates by molecular beam epitaxy. The crystalline qualities of In0.8Al0.2Sb/InSb layers were improved by decreasing the V/III flux ratio at a fixed temperature (380 degrees C) and increasing the growth temperature of the fixed V/III ratio (6). Dislocations were only observed in the In0.8Al0.2Sb/InSb layers grown at the optimal condition. On the other hand, many planar defects, including microtwins, were observed when the In0.8Al0.2Sb/InSb layers were grown in the Sb-rich condition. Specifically, V-shaped defects drawn boundaries in the microtwins were observed in the In0.8Al0.2Sb/InSb layer. (c) 2006 Elsevier B.V. All rights reserved.
Publisher
ELSEVIER SCIENCE BV
Issue Date
2006-10
Language
English
Article Type
Article
Keywords

MOLECULAR-BEAM EPITAXY; MAGNETRON SPUTTER EPITAXY; BUFFER LAYER; GAAS SUBSTRATE; INSB FILMS; SUPERLATTICES; QUALITY; GASB; SI

Citation

JOURNAL OF CRYSTAL GROWTH, v.296, no.1, pp.75 - 80

ISSN
0022-0248
URI
http://hdl.handle.net/10203/92945
Appears in Collection
MS-Journal Papers(저널논문)
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