Design and evaluation of two dimensional metrological atomic force microscope using a planar nanoscanner

Abstract

An atomic force microscope (AFM) using a laser interferometer is regarded as one of the best solutions for the standardization of two dimensional length measurement systems. We propose a new two dimensional (2D) metrological AFM system, which uses an orthogonally decoupled XY scanner and a commercial AFM head. We designed a decoupled planar scanner having minimal parasitic errors, particularly crosstalk errors. The parasitic tilt error was measured and evaluated using an autocollimator. Furthermore, we evaluated the uncertainty of the combined system according to the Guide to the Expression of Uncertainty in Measurement.