Effect of bias on the as-deposited grain structure of Cr thin film

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The film growth of Cr thin film by DC-magnetron sputter deposition was investigated by experimentally measuring the evolution of grain size distribution and by computing the film growth using Monte Carlo simulation. The as-deposited Cr thin film by sputter deposition typically grows in a columnar grain structure at the substrate temperature 260℃, which is far lower than 0.3 Tm. The stagnation of columnar grain structure does not occur in the case of no-bias condition up to the investigated film thickness of about 800 nm. However, the application of a negative bias of 200 V results in a stagnation of columnar grain structure at film thickness of about 50 nm and at the deposition temperature of 260℃. This is believed to arise from the fact that the mobility of ad-atoms is greatly enhanced and the Ar+ ions pin the grain boundary as a result of bias application.
Publisher
대한금속·재료학회
Issue Date
2003-04
Language
English
Citation

METALS AND MATERIALS INTERNATIONAL, v.9, no.2, pp.115 - 119

ISSN
1598-9623
URI
http://hdl.handle.net/10203/84961
Appears in Collection
MS-Journal Papers(저널논문)
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