실리콘 마이크로 머시닝을 위한 자기 정렬 특성을 갖는 새로운 실리콘 식각방법과 식각특성분석A Method to Etch Through Silicon With Self-Aligned Property for Silicon Micromachining and Characterization of its Etching Mechanism
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 이희덕 | ko |
| dc.contributor.author | 김재관 | ko |
| dc.contributor.author | 정훈주 | ko |
| dc.contributor.author | 한철희 | ko |
| dc.date.accessioned | 2013-02-27T21:25:23Z | - |
| dc.date.available | 2013-02-27T21:25:23Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1996-10 | - |
| dc.identifier.citation | 전기학회논문지, v.45, no.10, pp.1433 - 1438 | - |
| dc.identifier.issn | 1340-5551 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/70936 | - |
| dc.language | Korean | - |
| dc.publisher | 대한전기학회 | - |
| dc.title | 실리콘 마이크로 머시닝을 위한 자기 정렬 특성을 갖는 새로운 실리콘 식각방법과 식각특성분석 | - |
| dc.title.alternative | A Method to Etch Through Silicon With Self-Aligned Property for Silicon Micromachining and Characterization of its Etching Mechanism | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 45 | - |
| dc.citation.issue | 10 | - |
| dc.citation.beginningpage | 1433 | - |
| dc.citation.endingpage | 1438 | - |
| dc.citation.publicationname | 전기학회논문지 | - |
| dc.contributor.localauthor | 한철희 | - |
| dc.contributor.nonIdAuthor | 이희덕 | - |
| dc.contributor.nonIdAuthor | 김재관 | - |
| dc.contributor.nonIdAuthor | 정훈주 | - |
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