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Investigation of gate length and fringing field effects for program and erase efficiency in gate-all-around SONOS memory cells Kim, Moon-Seok; Choi, Sung-Jin; Moon, Dong-Il; Duarte, Juan P.; Kim, Sung-Ho; Choi, Yang-Kyu, SOLID-STATE ELECTRONICS, v.79, pp.7 - 10, 2013-01 |
고축합 불화 메타크릴레이트 하이브리머 Low-k 유전체 코팅의 제조 및 특성 = Fabrication and characteristics of highly condensed fluorinated methacrylate hybrimer dielectric coating for transparent Low-k passivation layer in LCD-TFTlink 오지훈; Oh, Ji-Hoon; et al, 한국과학기술원, 2010 |
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