NiSi2 / Si ( 111 ) 계면에 대한 고분해능 투과전자현미경 연구High-Resolution Transmission Electron Microscopy Study of the NiSi2/Si(111) Interface
- Publisher
- 대한금속·재료학회
- Issue Date
- 1994-12
- Language
- Korean
- Citation
대한금속·재료학회지, v.32, no.11, pp.1331 - 1337
- ISSN
- 1738-8228
- Appears in Collection
- MS-Journal Papers(저널논문)
- Files in This Item
- There are no files associated with this item.
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