NiSi2 / Si ( 111 ) 계면에 대한 고분해능 투과전자현미경 연구High-Resolution Transmission Electron Microscopy Study of the NiSi2/Si(111) Interface
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 이은하 | ko |
| dc.contributor.author | 이정용 | ko |
| dc.contributor.author | 최치규 | ko |
| dc.date.accessioned | 2013-02-27T05:58:13Z | - |
| dc.date.available | 2013-02-27T05:58:13Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1994-12 | - |
| dc.identifier.citation | 대한금속·재료학회지, v.32, no.11, pp.1331 - 1337 | - |
| dc.identifier.issn | 1738-8228 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/66853 | - |
| dc.language | Korean | - |
| dc.publisher | 대한금속·재료학회 | - |
| dc.title | NiSi2 / Si ( 111 ) 계면에 대한 고분해능 투과전자현미경 연구 | - |
| dc.title.alternative | High-Resolution Transmission Electron Microscopy Study of the NiSi2/Si(111) Interface | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 32 | - |
| dc.citation.issue | 11 | - |
| dc.citation.beginningpage | 1331 | - |
| dc.citation.endingpage | 1337 | - |
| dc.citation.publicationname | 대한금속·재료학회지 | - |
| dc.contributor.localauthor | 이정용 | - |
| dc.contributor.nonIdAuthor | 이은하 | - |
| dc.contributor.nonIdAuthor | 최치규 | - |
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