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NO	Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)
1	Characteristics of the Deposition Rate per Unit Power on Pulsed-DC Magnetron Sputtering Source An, Sang-Hyuk; In, Jung-Hwan; Chang, Hong-Young, PLASMA PROCESSES AND POLYMERS, v.6, no.12, pp.855 - 859, 2009-12
2	Role of low-frequency power in dual-frequency capacitive discharges Ahn, Seung Kyu; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.95, no.11, 2009-09
3	Three-step decay of the plasma density near the substrate in pulsed-dc magnetron sputtering discharge In, Jung Hwan; Na, Byung Keun; Seo, SH; Chang, Hong-Young; Han, JG, PLASMA SOURCES SCIENCE & TECHNOLOGY, v.18, 2009-11

Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)

An, Sang-Hyuk; In, Jung-Hwan; Chang, Hong-Young, PLASMA PROCESSES AND POLYMERS, v.6, no.12, pp.855 - 859, 2009-12

Ahn, Seung Kyu; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.95, no.11, 2009-09

In, Jung Hwan; Na, Byung Keun; Seo, SH; Chang, Hong-Young; Han, JG, PLASMA SOURCES SCIENCE & TECHNOLOGY, v.18, 2009-11

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