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| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Experimental observation of the inductive electric field and related plasma nonuniformity in high frequency capacitive discharge Ahn, Seung Kyu; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.93, no.3, 2008-07 | |
| Pressure limitation of electron density measurement using a wave-cutoff method in weakly ionized plasmas Jun, Hyun-Su; Lee, Yun-Seong; Na, Byung-Keun; Chang, Hong-Young, PHYSICS OF PLASMAS, v.15, 2008-12 | |
| A novel pulsing method for the enhancement of the deposition rate in high power pulsed magnetron sputtering In, Jung-Hwan; Seo, Sang-Hun; Chang, Hong-Young, SURFACE COATINGS TECHNOLOGY, v.202, no.22-23, pp.5298 - 5301, 2008-08 | |
| Development of 40 MHz inductively coupled plasma source and frequency effects on plasma parameters Jun, Hyun-Su; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.92, no.4, 2008-01 |
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