Development of 40 MHz inductively coupled plasma source and frequency effects on plasma parameters

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A large-area inductively coupled plasma (ICP) source capable of securing azimuthal plasma uniformity at a 40.00 MHz has been developed. The antenna, referred to as a capacitor distributed resonance antenna, minimizes the azimuthally nonuniform antenna capacitive field with eight distributed vertical capacitors. The antenna was designed to maximize the antenna current using L-C series resonance. Based on plasma diagnostics with a 13.56 MHz conventional ICP, comparative analyses were performed in terms of the plasma density, electron temperature, and frequency characteristics of the electron energy probability function (EEPF). In addition, the frequency dependency of the EEPF was found in the collisional (nu(en)>omega), normal skin [v(th)/delta <<(omega(2)+nu(2)(en))(1/2)] regime and the physical causes of were examined.
Publisher
AMER INST PHYSICS
Issue Date
2008-01
Language
English
Article Type
Article
Keywords

INTERNAL-ANTENNA

Citation

APPLIED PHYSICS LETTERS, v.92, no.4

ISSN
0003-6951
DOI
10.1063/1.2838306
URI
http://hdl.handle.net/10203/9339
Appears in Collection
PH-Journal Papers(저널논문)
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