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NO	Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)
1	Electron and ion kinetics in magnetized capacitively coupled plasma source Lee, SH; You, SJ; Chang, Hong-Young; Lee, JK, JOURNAL OF VACUUM SCIENCE &AMP; TECHNOLOGY A, v.25, pp.455 - 463, 2007-05
2	Proceedings of the international symposium on dry process - DPS 2005 Fujiwara, Nobuo; Stamate, Eugen; Yeom, Geun-Young; Shiratani, Masaharu; Chang, Hong-Young; Economou, Demetre J.; Kusano, Eiji; Chang, Jane P., THIN SOLID FILMS, v.515, no.12, pp.4843 - 4845, 2007-04
3	Highly selective SiO2 etching in low-electron-temperature inductively coupled plasma Bai, KH; Chang, Hong-Young; Kwon, GC; Kim, HS; Kim, JS, JAPANESE JOURNAL OF APPLIED PHYSICS, v.46, pp.3602 - 3604, 2007-06
4	Photodissociation effects on the electron density and on FTIR measurements in a BTMSM/Ar discharge Jung, WB; Jang, YJ; Choi, CK; Chang, Hong-Young, JOURNAL OF PHYSICS D-APPLIED PHYSICS, v.40, pp.4164 - 4167, 2007-07
5	Gap length effect on electron energy distribution in capacitive radio frequency discharges You, S. J.; Kim, S. S.; Kim, Jung-Hyung; Seong, Dae-Jin; Shin, Yong-Hyeon; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.91, no.22, 2007-11
6	Wave transmission characteristics of a wave-cutoff probe in weakly ionized plasmas Jun, HS; Na, BK; Chang, Hong-Young; Kim, JH, PHYSICS OF PLASMAS, v.14, pp.967 - 982, 2007-09

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