Results 1-8 of 8 (Search time: 0.004 seconds).
NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
---|---|
Effects of substrate bias voltage on plasma parameters in temperature control using a grid system Bai, KH; Hong, JI; You, SJ; Chang, Hong-Young, PHYSICS OF PLASMAS, v.8, no.9, pp.4246 - 4250, 2001-09 | |
On inductively coupled plasmas for next-generation processing Lee, YK; Lee, DS; Bai, KH; Chung, CW; Chang, Hong-Young, SURFACE COATINGS TECHNOLOGY, v.169, pp.20 - 23, 2003-06 | |
Control of ion species in inductively coupled oxidation plasma by inert gas mixing Bai, KH; Chang, Hong-Young, JOURNAL OF APPLIED PHYSICS, v.100, pp.443 - 448, 2006-12 | |
Highly selective SiO2 etching in low-electron-temperature inductively coupled plasma Bai, KH; Chang, Hong-Young; Kwon, GC; Kim, HS; Kim, JS, JAPANESE JOURNAL OF APPLIED PHYSICS, v.46, pp.3602 - 3604, 2007-06 | |
Pressure and helium mixing effects on plasma parameters in temperature control using a grid system Bai, KH; Hong, JI; Chung, CW; Kim, SS; Chang, Hong-Young, PHYSICS OF PLASMAS, v.8, no.7, pp.3498 - 3501, 2001-07 | |
Electron temperature analysis of two-gas-species inductively coupled plasma Bai, KH; Chang, Hong-Young; Uhm, HS, APPLIED PHYSICS LETTERS, v.79, no.11, pp.1596 - 1598, 2001-09 | |
Power dissipation mode transition by a magnetic field You, SJ; Chung, CW; Bai, KH; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.81, no.14, pp.2529 - 2531, 2002-09 | |
Plasma parameters analysis of various mixed gas inductively coupled plasmas Bai, KH; You, SJ; Chang, Hong-Young; Uhm, HS, PHYSICS OF PLASMAS, v.9, no.6, pp.2831 - 2838, 2002-06 |
Discover