Browse "MS-Journal Papers(저널논문)" by Type Article

Showing results 5321 to 5340 of 7245

5321
Rational design of protective In2O3 layer-coated carbon nanopaper membrane: Toward stable cathode for long-cycle Li-O-2 batteries

Jung, Ji-Won; Choi, Dong-Won; Lee, Chan Kyu; Yoon, Ki Ro; Yu, Sunmoon; Cheong, Jun Young; Kim, Chanhoon; et al, NANO ENERGY, v.46, pp.193 - 202, 2018-04

5322
Rational design of Sn-based multicomponent anodes for high performance lithium-ion batteries: SnO2@TiO2@reduced graphene oxide nanotubes

Cheong, Jun Young; Kim, Chanhoon; Jang, Ji Soo; Kim, Il-Doo, RSC ADVANCES, v.6, no.4, pp.2920 - 2925, 2016

5323
Rationally designed CuSb1-xBixS2 as a promising photovoltaic material: Theoretical and experimental study

Park, Bo-In; Je, Minyeong; Oh, Jihun; Choi, Heechae; Lee, Seung Yong, SCRIPTA MATERIALIA, v.179, pp.107 - 112, 2020-04

5324
Rationally Designed TiO2 Nanostructures of Continuous Pore Network for Fast-Responding and Highly Sensitive Acetone Sensor

Suh, Jun Min; Cho, Donghwi; Lee, Sangmin; Lee, Tae Hyung; Jung, Jae-Wook; Lee, Jinho; Cho, Sung Hwan; et al, SMALL METHODS, v.5, no.12, 2021-12

5325
Rationally Designed Window Layers for High Efficiency Perovskite/Si Tandem Solar Cells

Park, Ik Jae; Kim, Dong Hoe; Ji, Su Geun; Ahn, You Jin; Park, So Jeong; Kim, Daehan; Shin, Byungha; et al, ADVANCED OPTICAL MATERIALS, v.9, no.20, pp.2100788, 2021-10

5326
Rattle-Structured Upconversion Nanoparticles for Near-IR-Induced Suppression of Alzheimer's beta-Amyloid Aggregation

Kuk, Su Keun; Lee, Byung Il; Lee, Joon Seok; Park, Chan Beum, SMALL, v.13, no.11, 2017-03

5327
RBS Measurements of GexSi1-x/Si(100) Crystals Grown by Solid Phase Epitaxy by Using an a-Ge/Au/Si(100) Structure

H.S. Kim; J.J. Lee; K.H. Kim; T.G. Im; C.K. Choi; J.Y. Lee, 응용물리, v.10, no.3, pp.252 - 257, 1997-12

5328
Re-entrant relaxor ferroelectricity of methylammonium lead iodide

Guo, Haiyan; Liu, Peixue; Zheng, Shichao; Zeng, Shixian; Liu, Na; Hong, Daniel Seungbum, CURRENT APPLIED PHYSICS, v.16, no.12, pp.1603 - 1606, 2016-12

5329
Reaction characteristics between Cu thin film and RF inductively coupled Cl-2 plasma without/with UV irradiation

Kwon, MS; Lee, JeongYong; Choi, KS; Han, CH, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.37, no.7, pp.4103 - 4108, 1998-07

5330
Reaction mechanism of low-temperature Cu dry etching using an inductively coupled Cl-2/N-2 plasma with ultraviolet light irradiation

Kwon, MS; Lee, JeongYong, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.146, no.8, pp.3119 - 3123, 1999-08

5331
Reaction of Terfenol-D melts with SiO2 crucibles

Kwon, Y; Kwon, O; Kim, M; Wee, Dang-Moon, MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, v.129, no.1-3, pp.18 - 21, 2006-04

5332
Reaction Path of Cu2ZnSnS4 Nanoparticles by a Solvothermal Method Using Copper Acetate, Zinc Acetate, Tin Chloride and Sulfur in Diethylenetriamine Solvent

Cghalapathy, RBV; Jung, Gwangsun; Ko, Young Min; Ahn, Byung Tae; Kwon, Hyuk-Sang, Current Photovoltaic Research, v.1, no.2, pp.109 - 114, 2013-06

5333
Reaction synthesis and microstructures of NiAl/Ni micro-laminated composites

Kim, HY; Chung, DS; Hong, Soon-Hyung, MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, v.396, pp.376 - 384, 2005-04

5334
Reaction-Based Processing Methods for Ceramics and Composites ; Ceramic-Matrix Composites Fabricated by the Lanxide Process

김도경; 이성, 세라미스트, v.6, no.3, pp.182 - 189, 1991-03

5335
Reaction-sintered LAGP solid electrolytes with MoS2 coating for improved stability with Li metal

Baek, Seung Jin; Cha, Eunho; Kim, Dong Gyu; Yun, Jong Hyuk; Kim, Do Kyung, CERAMICS INTERNATIONAL, v.48, no.23, pp.34828 - 34836, 2022-12

5336
REACTIVE HOT PRESSING AND OXIDATION BEHAVIOR OF Hf-BASED ULTRA-HIGH-TEMPERATURE CERAMICS

Lee, Seung-Jun; Kang, Eul-Son; Baek, Seung-Su; Kim, Do-Kyung, SURFACE REVIEW AND LETTERS, v.17, no.2, pp.215 - 221, 2010-04

5337
Reactive ion etching mechanism of copper film in chlorine-based electron cyclotron resonance plasma

Lee, SK; Chun , Soung Soon; Hwang, CY; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.36, no.1A, pp.50 - 55, 1997-01

5338
REACTIVE ION ETCHING MECHANISM OF PLASMA-ENHANCED CHEMICALLY VAPOR-DEPOSITED ALUMINUM-OXIDE FILM IN CF4/O-2 PLASMA

KIM, JW; KIM, YC; Lee, Won-Jong, JOURNAL OF APPLIED PHYSICS, v.78, no.3, pp.2045 - 2049, 1995-08

5339
Reactive ion etching mechanism of RuO2 thin films in oxygen plasma with the addition of CF4, Cl-2, and N-2

Lee, EJ; Kim, JW; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.37, no.5A, pp.2634 - 2641, 1998-05

5340
Reactive processing and mechanical properties of ZrO2/NiAl intermetallic matrix composite

Ryu, HC; Shim, MK; Hong, Soon-Hyung, JOURNAL OF MATERIALS PROCESSING TECHNOLOGY, v.63, no.1-3, pp.411 - 416, 1997-01

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