Novel body-tied silicon-on-insulator (SOI) n-channel metal-oxide-semiconductor field-effect transistor with grounded body electrode

Abstract

A novel body-tied silicon-on-insulator (SOI) n-channel metal-oxide-semiconductor field-effect transistor with grounded body electrode named GBSOI nMOSFET has been developed by wafer bonding and etch-back technology. It has no floating body effect such as kink phenomena on the drain current curves, single-transistor latch and drain current overshoot inherent in a normal SOI device with floating body. We have characterized the interface trap density, kink phenomena on the drain current (IDS-VDS) curves, substrate resistance effect on the IDS-VDS curves, subthreshold current characteristics and single transistor latch of these transistors. We have confirmed that the GBSOI structure is suitable for high-speed and low-voltage VLSI circuits.