실리콘 양극 산화방법에 의한 실리콘내의 보론과 아세닉 확산분포의 측정

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Publisher
대한전자공학회
Issue Date
1981-02
Language
Korean
Citation

전자공학회지, v.18, no.1, pp.7 - 19

ISSN
1975-2377
URI
http://hdl.handle.net/10203/59723
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