The Fabrication of the ZrO2 Thin Film by Chemical Vapor Deposition and the Effect of the Reaction Parameters on the Deposition Characteristics
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | J.H. Choi | ko |
| dc.contributor.author | H.G. Kim | ko |
| dc.date.accessioned | 2013-02-24T12:02:15Z | - |
| dc.date.available | 2013-02-24T12:02:15Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1991 | - |
| dc.identifier.citation | 요업학회지, v.28, no.1, pp.1 - 10 | - |
| dc.identifier.issn | 1225-1372 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/56994 | - |
| dc.language | Korean | - |
| dc.publisher | 한국요업학회 | - |
| dc.title | The Fabrication of the ZrO2 Thin Film by Chemical Vapor Deposition and the Effect of the Reaction Parameters on the Deposition Characteristics | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 28 | - |
| dc.citation.issue | 1 | - |
| dc.citation.beginningpage | 1 | - |
| dc.citation.endingpage | 10 | - |
| dc.citation.publicationname | 요업학회지 | - |
| dc.contributor.localauthor | H.G. Kim | - |
| dc.contributor.nonIdAuthor | J.H. Choi | - |
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