동시증착에 의한 Si(111) - 7×7 기판 위에 TiSi₂ 에피택셜 성장In-situ Epitaxial Growth of the TiSi2 on Si (111)-7*7 Substrate by Codeposition
- Publisher
- 한국진공학회
- Issue Date
- 1994-12
- Language
- Korean
- Citation
한국진공학회지, v.3, no.4, pp.405 - 413
- ISSN
- 1225-8822
- Appears in Collection
- MS-Journal Papers(저널논문)
- Files in This Item
- There are no files associated with this item.
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