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Low-dielectric-constant-film deposition with various gases in a helicon plasma reactor Yun, SM; Chang, Hong-Young; Oh, KS; Choi, CK, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.38, no.7B, pp.4531 - 4534, 1999-07 |
펄스 마그네트론 스퍼터링을 이용한 ITO 막박 증착에 관한 연구 = Characteristics of ITO thin film by using pulsed-DC magnetron sputteringlink 이진우; Lee, Jin-U; et al, 한국과학기술원, 2011 |
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