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Browse "Dept. of Physics(물리학과)" by Author Bai, KH

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Showing results 1 to 17 of 17

1	Control and analysis of ion species in inductively coupled nitration plasma using a grid system Bai, KH; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.87, pp.299 - 308, 2005-09
2	Control and analysis of ion species in N-2 inductively coupled plasma with inert gas mixing Bai, KH; Lee, DS; Chang, Hong-Young; Uhm, HS, APPLIED PHYSICS LETTERS, v.80, no.21, pp.3907 - 3909, 2002-05
3	Control of electron density and temperature with a modified capacitive discharge You, SJ; Bai, KH; Chae, SH; Chang, Hong-Young, PLASMA CHEMISTRY AND PLASMA PROCESSING, v.25, pp.245 - 254, 2005-06
4	Control of electron temperature using grid bias voltage and its application to etching using fluorocarbon gases. Bai, KH; Hong, JI; You, SJ; Chang, Hong-Young, ESFC-13, ESFC, 2001
5	Control of ion species in inductively coupled oxidation plasma by inert gas mixing Bai, KH; Chang, Hong-Young, JOURNAL OF APPLIED PHYSICS, v.100, pp.443 - 448, 2006-12
6	Effects of substrate bias voltage on plasma parameters in temperature control using a grid system Bai, KH; Hong, JI; You, SJ; Chang, Hong-Young, PHYSICS OF PLASMAS, v.8, no.9, pp.4246 - 4250, 2001-09
7	Electron temperature analysis of two-gas-species inductively coupled plasma Bai, KH; Chang, Hong-Young; Uhm, HS, APPLIED PHYSICS LETTERS, v.79, no.11, pp.1596 - 1598, 2001-09
8	Electron Temperature control in ICP using grid and its use for control the ion ratio in CF4 / Ar plasma Bai, KH; Hong, JI; Kim, SS; Chang, Hong-Young, 53rd Annual Gaseous Electronic Conference, APS Physics, 2000
9	Electron temperature control with a small mesh number grid in inductively coupled plasmas Bai, KH; Choi, CK; Chang, Hong-Young, PLASMA SOURCES SCIENCE & TECHNOLOGY, v.13, pp.662 - 667, 2004-11
10	Highly selective SiO2 etching in low-electron-temperature inductively coupled plasma Bai, KH; Chang, Hong-Young; Kwon, GC; Kim, HS; Kim, JS, JAPANESE JOURNAL OF APPLIED PHYSICS, v.46, pp.3602 - 3604, 2007-06
11	On inductively coupled plasmas for next-generation processing Lee, YK; Lee, DS; Bai, KH; Chung, CW; Chang, Hong-Young, SURFACE COATINGS TECHNOLOGY, v.169, pp.20 - 23, 2003-06
12	On the heating mode transition in high-frequency inductively coupled argon discharge Seo, SH; Hong, JI; Bai, KH; Chang, Hong-Young, PHYSICS OF PLASMAS, v.6, no.2, pp.614 - 618, 1999-02
13	Paradoxical sheath width variation in transversely magnetized capacitive coupled plasma You, SJ; Bai, KH; In, JH; Chang, Hong-Young; Choi, CK, SURFACE & COATINGS TECHNOLOGY, v.171, pp.226 - 230, 2003-07
14	Plasma parameters analysis of various mixed gas inductively coupled plasmas Bai, KH; You, SJ; Chang, Hong-Young; Uhm, HS, PHYSICS OF PLASMAS, v.9, no.6, pp.2831 - 2838, 2002-06
15	Power dissipation mode transition by a magnetic field You, SJ; Chung, CW; Bai, KH; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.81, no.14, pp.2529 - 2531, 2002-09
16	Pressure and helium mixing effects on plasma parameters in temperature control using a grid system Bai, KH; Hong, JI; Chung, CW; Kim, SS; Chang, Hong-Young, PHYSICS OF PLASMAS, v.8, no.7, pp.3498 - 3501, 2001-07
17	The effects of mixing molecular gases on plasma parameters in a system with a grid-controlled electron temperature Bai, KH; Hong, JI; You, SJ; Choi, CK; Chang, Hong-Young, PHYSICS OF PLASMAS, v.9, no.3, pp.1025 - 1028, 2002-03

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