R.F. 마그네트론 스퍼터링법으로 증착한 ITO박막에 작업 압력이 전기적 특성에 미치는 영향Effect of the working pressures on electrical properties of ITO thin films deposited by R.F. magnetron sputtering
- Advisors
- 최시경researcher; Choi, Si-Kyungresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 2002
- Identifier
- 177062/325007 / 020003483
- Language
- kor
- Description
학위논문(석사) - 한국과학기술원 : 재료공학과, 2002.8, [ iii, 57 p. ]
- Keywords
산화 주석 박막; 저온 증착; low temperature deposition; Indium Tin Oxide
- Appears in Collection
- MS-Theses_Master(석사논문)
- Files in This Item
- There are no files associated with this item.
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