R.F. 마그네트론 스퍼터링법으로 증착한 ITO박막에 작업 압력이 전기적 특성에 미치는 영향Effect of the working pressures on electrical properties of ITO thin films deposited by R.F. magnetron sputtering
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 최시경 | - |
| dc.contributor.advisor | Choi, Si-Kyung | - |
| dc.contributor.author | 전용선 | - |
| dc.contributor.author | Jeon, Yong-Seon | - |
| dc.date.accessioned | 2011-12-15T01:34:49Z | - |
| dc.date.available | 2011-12-15T01:34:49Z | - |
| dc.date.issued | 2002 | - |
| dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=177062&flag=dissertation | - |
| dc.identifier.uri | http://hdl.handle.net/10203/50891 | - |
| dc.description | 학위논문(석사) - 한국과학기술원 : 재료공학과, 2002.8, [ iii, 57 p. ] | - |
| dc.language | kor | - |
| dc.publisher | 한국과학기술원 | - |
| dc.subject | 산화 주석 박막 | - |
| dc.subject | 저온 증착 | - |
| dc.subject | low temperature deposition | - |
| dc.subject | Indium Tin Oxide | - |
| dc.title | R.F. 마그네트론 스퍼터링법으로 증착한 ITO박막에 작업 압력이 전기적 특성에 미치는 영향 | - |
| dc.title.alternative | Effect of the working pressures on electrical properties of ITO thin films deposited by R.F. magnetron sputtering | - |
| dc.type | Thesis(Master) | - |
| dc.identifier.CNRN | 177062/325007 | - |
| dc.description.department | 한국과학기술원 : 재료공학과, | - |
| dc.identifier.uid | 020003483 | - |
| dc.contributor.localauthor | 최시경 | - |
| dc.contributor.localauthor | Choi, Si-Kyung | - |
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