유도결합 $N_2O$ 플라즈마를 이용한 실리콘 산화막의 특성과 다결정 실리콘 박막 트랜지스터에의 응용에 관한 연구A study on the characteristics of inductively coupled $N_2O$ plasma silicon oxide and its application to polycrystalline silicon thin film transistors
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 안병태 | - |
| dc.contributor.advisor | Ahn, Byung-Tae | - |
| dc.contributor.author | 원만호 | - |
| dc.contributor.author | Won, Man-Ho | - |
| dc.date.accessioned | 2011-12-15T01:33:48Z | - |
| dc.date.available | 2011-12-15T01:33:48Z | - |
| dc.date.issued | 2001 | - |
| dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=165933&flag=dissertation | - |
| dc.identifier.uri | http://hdl.handle.net/10203/50830 | - |
| dc.description | 학위논문(석사) - 한국과학기술원 : 재료공학과, 2001.2, [ 77 p. ] | - |
| dc.language | kor | - |
| dc.publisher | 한국과학기술원 | - |
| dc.subject | 전계효과 이동도 | - |
| dc.subject | 다결정 실리콘 박막 트랜지스터 | - |
| dc.subject | 유도결합 플라즈마 | - |
| dc.subject | inductively coupled plasma (ICP) | - |
| dc.subject | field effect mobility | - |
| dc.subject | effective charge density | - |
| dc.subject | poly-Si TFT | - |
| dc.title | 유도결합 $N_2O$ 플라즈마를 이용한 실리콘 산화막의 특성과 다결정 실리콘 박막 트랜지스터에의 응용에 관한 연구 | - |
| dc.title.alternative | A study on the characteristics of inductively coupled $N_2O$ plasma silicon oxide and its application to polycrystalline silicon thin film transistors | - |
| dc.type | Thesis(Master) | - |
| dc.identifier.CNRN | 165933/325007 | - |
| dc.description.department | 한국과학기술원 : 재료공학과, | - |
| dc.identifier.uid | 000993333 | - |
| dc.contributor.localauthor | 안병태 | - |
| dc.contributor.localauthor | Ahn, Byung-Tae | - |
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