ECR PECVD법을 이용한 SiOF 박막의 증착 특성 및 유전율 안정화에 관한 연구A study on the deposition characteristics and the dielectric stability of the SiOF films deposited by ECR PECVD
- Advisors
- 이원종researcher; Lee, Won-Jongresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 1999
- Identifier
- 150196/325007 / 000963297
- Language
- kor
- Description
학위논문(석사) - 한국과학기술원 : 재료공학과, 1999.2, [ viii, 104 p. ]
- Keywords
저유전율; 플라즈마; ECR; SiOF; Low dielectric constant; Plasma
- Appears in Collection
- MS-Theses_Master(석사논문)
- Files in This Item
- There are no files associated with this item.
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