ECR PECVD법을 이용한 SiOF 박막의 증착 특성 및 유전율 안정화에 관한 연구A study on the deposition characteristics and the dielectric stability of the SiOF films deposited by ECR PECVD
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 이원종 | - |
| dc.contributor.advisor | Lee, Won-Jong | - |
| dc.contributor.author | 변경문 | - |
| dc.contributor.author | Byun, Kyung-Mun | - |
| dc.date.accessioned | 2011-12-15T01:32:26Z | - |
| dc.date.available | 2011-12-15T01:32:26Z | - |
| dc.date.issued | 1999 | - |
| dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=150196&flag=dissertation | - |
| dc.identifier.uri | http://hdl.handle.net/10203/50748 | - |
| dc.description | 학위논문(석사) - 한국과학기술원 : 재료공학과, 1999.2, [ viii, 104 p. ] | - |
| dc.language | kor | - |
| dc.publisher | 한국과학기술원 | - |
| dc.subject | 저유전율 | - |
| dc.subject | 플라즈마 | - |
| dc.subject | ECR | - |
| dc.subject | SiOF | - |
| dc.subject | Low dielectric constant | - |
| dc.subject | Plasma | - |
| dc.title | ECR PECVD법을 이용한 SiOF 박막의 증착 특성 및 유전율 안정화에 관한 연구 | - |
| dc.title.alternative | A study on the deposition characteristics and the dielectric stability of the SiOF films deposited by ECR PECVD | - |
| dc.type | Thesis(Master) | - |
| dc.identifier.CNRN | 150196/325007 | - |
| dc.description.department | 한국과학기술원 : 재료공학과, | - |
| dc.identifier.uid | 000963297 | - |
| dc.contributor.localauthor | 이원종 | - |
| dc.contributor.localauthor | Lee, Won-Jong | - |
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