코스퍼터링 $TiSi_2$ 박막의 상변태(C49→C54)와 응력해석Phase transformation (C49→C54) of $TiSi_2$ Co-Sputtered thin film and stress analysis
- Advisors
- 박중근researcher; Park, Joong-Keunresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 1997
- Identifier
- 113133/325007 / 000953118
- Language
- kor
- Description
학위논문(석사) - 한국과학기술원 : 재료공학과, 1997.2, [ iv, 64 p. ]
- Keywords
응력; 변태 온도; 타이타늄실리사이드; 코스퍼터링; 면저항; Sheet resistance; Stress; Transformation temperature; TiSi2; Cosputtering
- Appears in Collection
- MS-Theses_Master(석사논문)
- Files in This Item
- There are no files associated with this item.
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