염소계 플라즈마를 이용한 구리박막의 건식 식각기구에 관한 연구 = A study on the dry etching mechanism of copper film in chlorine-based plasma

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Advisors
이원종researcherLee, Won-Jongresearcher
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
1997
Identifier
113003/325007 / 000935257
Language
kor
Description

학위논문(박사) - 한국과학기술원 : 재료공학과, 1997.2, [ iii, 134 p. ]

Keywords

표면분석; 전자자기공명; 기구; 식각; 구리; 반도체; Semiconductor; XPS; ECR; Mechanism; Etching; Copper

URI
http://hdl.handle.net/10203/50171
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=113003&flag=dissertation
Appears in Collection
MS-Theses_Ph.D.(박사논문)
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