염소계 플라즈마를 이용한 구리박막의 건식 식각기구에 관한 연구A study on the dry etching mechanism of copper film in chlorine-based plasma
- Advisors
- 이원종researcher; Lee, Won-Jongresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 1997
- Identifier
- 113003/325007 / 000935257
- Language
- kor
- Description
학위논문(박사) - 한국과학기술원 : 재료공학과, 1997.2, [ iii, 134 p. ]
- Keywords
표면분석; 전자자기공명; 기구; 식각; 구리; 반도체; Semiconductor; XPS; ECR; Mechanism; Etching; Copper
- Appears in Collection
- MS-Theses_Ph.D.(박사논문)
- Files in This Item
- There are no files associated with this item.
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